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Substrate processing apparatus, and magnetic recording medium manufacturing method

A technology for substrate processing and equipment, applied in the field of substrate processing equipment, can solve the problems of mutual contamination and damage of ion beam generators and mutual influence of ion beams of ion beam generators, and achieve the effect of suppressing mutual pollution and damage

Active Publication Date: 2010-02-10
CANON ANELVA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, the technique of opposingly arranging ion guns (ion beam generators) on opposite surfaces of substrates as in Japanese Patent Laid-Open No. 2005-56535 has a problem that the opposing ion beam generators are mutually influenced by their ion beams.
As a result, there is a problem of mutual contamination and / or damage of the interior of the ion beam generator

Method used

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  • Substrate processing apparatus, and magnetic recording medium manufacturing method
  • Substrate processing apparatus, and magnetic recording medium manufacturing method
  • Substrate processing apparatus, and magnetic recording medium manufacturing method

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Embodiment Construction

[0027] Embodiments of the present invention will be described below with reference to the drawings. However, the present invention is not limited to this embodiment.

[0028] refer to figure 1 A substrate processing apparatus according to an embodiment of the present invention will be described. figure 1 is a block diagram showing the structure of the substrate processing apparatus according to the present embodiment viewed from above.

[0029] Such as figure 1 As shown, the substrate processing apparatus 100 mainly includes a substrate (wafer) W, first and second ion beam generators 1 a and 1 b oppositely arranged via the substrate W, a control unit 101 , a counter 103 and a computer interface 105 .

[0030] The substrate W in this embodiment is a substrate for a magnetic recording medium such as a hard disk, and generally has an opening formed at the center of a substantially circular disk-shaped substrate. The substrate W is held in a vertical position in a vertical dir...

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Abstract

The present invention provides a substrate processing apparatus capable of suppressing mutual contamination and / or damage of the insides of ion beam generators arranged opposite each other via a substrate, and a magnetic recording medium manufacturing method. A substrate processing apparatus according to an embodiment of the present invention includes a first ion beam generator that applies an ionbeam to one surface to be processed of a substrate, and a second ion beam generator that applies an ion beam to another surface to be processed, which are arranged opposite each other via the substrate, and an area of a first grid in the first ion beam generator and an area of a second grid in the second ion beam generator are arranged asymmetrical to each other.

Description

technical field [0001] The present invention relates to a substrate processing apparatus and a magnetic recording medium manufacturing method for processing both surfaces of a substrate by irradiating ion beams to both surfaces of the substrate in the manufacture of magnetic recording disks such as hard disks. Background technique [0002] The manufacture of magnetic recording disks such as hard disks is roughly divided into pre-processing and post-processing. Among them, the pre-processing includes the formation of the underlayer, the formation of the magnetic film for the recording layer, and the formation of the protective film for protecting the recording layer, and the post-processing Including, for example, the formation of a lubricating layer on the surface of a substrate on which a protective film has been formed. [0003] Generally, a magnetic recording disk has recording layers on both surfaces of a substrate, and therefore, in the aforementioned processing, variou...

Claims

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Application Information

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IPC IPC(8): G11B5/84
CPCG11B5/855
Inventor 山中和人芝本雅弘三好步人见聪大卫·朱利安托·贾亚普拉维拉
Owner CANON ANELVA CORP