Check patentability & draft patents in minutes with Patsnap Eureka AI!

Quantum interference transistor using graphene and methods of manufacturing and operating the same

A quantum interference, transistor technology, applied in the direction of transistor, semiconductor/solid-state device manufacturing, semiconductor device, etc., can solve problems such as difficult to use and difficult to manufacture

Active Publication Date: 2010-06-02
SAMSUNG ELECTRONICS CO LTD
View PDF4 Cites 12 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This type of quantum interference transistor can operate at high frequencies around 10 THz and can have low power consumption, but can be difficult to manufacture
Specifically, in the case of quantum interference transistors utilizing 2D electron gases or superconductors, quantum interference transistors can operate at temperatures much lower than 50K, and thus would be difficult to use

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Quantum interference transistor using graphene and methods of manufacturing and operating the same
  • Quantum interference transistor using graphene and methods of manufacturing and operating the same
  • Quantum interference transistor using graphene and methods of manufacturing and operating the same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0027] Example embodiments will now be described more fully with reference to the accompanying drawings. Embodiments may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these example embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope to those skilled in the art. In the drawings, the thicknesses of layers and regions may be exaggerated for clarity.

[0028] It will be understood that when an element is referred to as being “on,” “connected to,” “electrically connected to,” or “coupled to” another component, it can be directly on the other component. A component may be directly connected to, electrically connected to, or bonded directly to another component, or intervening components may be present. In contrast, when an element is referred to as being "directly on," "directly connected to," "directly electrically connected to," or "dire...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A quantum interference transistor may include a source; a drain; N channels (N>=2), between the source and the drain, and having N-1 path differences between the source and the drain; and at least one gate disposed at one or more of the N channels. One or more of the N channels may be formed in a graphene sheet. A method of manufacturing the quantum interference transistor may include forming one or more of the N channels using a graphene sheet. A method of operating the quantum interference transistor may include applying a voltage to the at least one gate. The voltage may shift a phase of a wave of electrons passing through a channel at which the at least one gate is disposed.

Description

technical field [0001] Example embodiments relate to transistors and / or methods of manufacturing and / or operating the same. Also, example embodiments relate to quantum interference transistors using graphene and / or methods of manufacturing and / or operating the quantum interference transistors. Background technique [0002] One method of increasing the degree of integration of a semiconductor device may be to reduce the size of elements of the semiconductor device. Therefore, an attempt to reduce the size of the element that has not been considered before can be made. For example, the length of the channel of transistors commonly used in semiconductor devices can be much larger than the coherent wavelength λ of electrons coherence . Therefore, the volatility of electrons is not considered in conventional semiconductor transistors. [0003] However, the degree of integration of current semiconductor devices may increase and / or the design specifications of semiconductor dev...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L29/78H01L29/10H01L21/336
CPCH01L29/16B82Y10/00H01L29/7613H01L29/1606H01L29/1029H01L29/66977
Inventor 申在光徐顺爱金钟燮洪起夏郑现钟
Owner SAMSUNG ELECTRONICS CO LTD
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More