Fully-automatic large-scale flat-plate type PECVD crystal silicon photovoltaic anti-reflection film preparation device

Abstract

The invention relates to a film preparation device, in particular to a fully automatic large-scale flat-plate type PECVD crystal silicon photovoltaic anti-reflection film preparation device with a single chamber working under the vacuum, which solves the problems of longer single production time and low output existing in a PECVD device with a tubular structure in the prior art as well as the problems that a multi-chamber flat type PECVD device is required to work under the vacuum and the like. The preparation device is mainly provided with a loading platform, a preheating platform, a PECVD chamber, a cooling platform, an unloading platform and a vacuum pumping system, wherein the loading platform, the preheating platform, the PECVD chamber, the cooling platform and the unloading platform are arranged on a rack in sequence; the preheating platform and the cooling platform are respectively connected with a protective gas pipeline; and the PECVD chamber is connected with the vacuum pumping system through the pipeline. The invention only provides the vacuum environment for the PECVD chamber, and other parts work under the atmosphere or the protective gas. The invention can always achieve the technical indexes of the tubular PECVD and the multi-chamber flat type PECVD under the situation that the single chamber only works under the vacuum.

Description

Technical field [0001] The invention relates to a thin film preparation device, in particular to a fully automatic large-scale flat plate PECVD (Plasma Enhanced Chemical Vapor Deposition) crystalline silicon photovoltaic anti-reflection coating equipment with a single chamber working under vacuum conditions. Background technique [0002] At present, the plasma-enhanced chemical vapor deposition method (ie, PECVD method) is mainly used to prepare an anti-reflection film on the surface of photovoltaic silicon. Because the plasma-enhanced chemical vapor deposition method (PECVD) is the most mature technology and relatively simple operation among several methods for preparing thin film materials, and it can prepare large-area thin films with high uniformity. At this stage, there are two types of equipment used in the photovoltaic field to prepare anti-reflection films. One is PECVD equipment with a tubular structure. The single production time of this structure is too long, resu...

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Problems solved by technology

[0003] The purpose of the present invention is to provide a fully automatic large-scale flat PECVD crystalline silicon photovoltaic anti-reflection coating equipment with a single chamber working under vacuum conditions, so as to solve the problem of excessive single production time in the PECVD equipment with tubular structure in the prior art. The problems of long length and low output, and the need to work under vacuum conditions in multi-chamber flat PECVD equipment

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