A two-translation precision positioning workbench for nanoimprint lithography system

Abstract

The invention discloses a two-degree-of-freedom precision positioning workbench for a nanoimprint lithography system, which includes a base, a moving platform, a rigid support connected to the bottom of the base, and a workbench connected between the moving platform and the base. Four flexible branch chains, four piezoelectric ceramic drivers are used in the structure, the tail of each driver is connected to the base through bolts, and the top is connected to the ball joint through threads to achieve Hertzian contact. Two position sensors are used to measure the actual output of the moving platform, and are respectively fixed between the rigid support and the moving platform. This precision positioning workbench has the characteristics of high resolution and fast dynamic response, and can be used as an auxiliary positioning platform for nanoimprint lithography positioning system to realize micro-feed and precise positioning.

Description

technical field [0001] The invention relates to a micro-operating system, in particular to a two-degree-of-freedom flexible parallel precision positioning workbench applicable to an imprint photolithography system. Background technique [0002] Nano-devices include nano-electronic devices and nano-optoelectronic devices, which can be widely used in electronics, optics, micro-mechanical devices, new computers, etc. It is the most dynamic research field in the field of new materials and new devices. , intelligence, high integration and other mainstream development directions. Due to the potential huge market and national defense value of nano-devices, the methods, approaches and processes of its design and manufacture have become the research and investment hotspots of many scientists, governments and large enterprises. At present, the design and manufacture of nano-devices is in a period of rapid development, and there are various methods, and patterning technology is one o...

AI Technical Summary

Problems solved by technology

Among these existing technologies, although the self-adaptive adjustment precision positioning system is simple in structure, compact in structure and low in cost, its positioning accuracy, especially the adjustment accuracy of parallelism is low, which limits the improvement of processing accuracy and quality

Although the parallelism between the imprint template and the substrate can be improved to a certain extent through active leveling and manual adjustment mechanisms, it cannot compensate for the parallelism error between the template and the substrate due to uneven imprint force during the imprinting process

The airbag cylinder type imprinting system overcomes the disadvantages that the silicone is easily stretched and deformed during the imprinting process, the imprinting force is unevenly distributed, and the template is easy to break. However, the design and use of the vacuum chamber is expensive and the imprinting time is too long.

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