A two-translation precision positioning workbench for nanoimprint lithography system
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- 江苏金秋刺绣花边有限公司
- Publication Date
- 2011-12-28
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Abstract
Description
technical field
[0001] The invention relates to a micro-operating system, in particular to a two-degree-of-freedom flexible parallel precision positioning workbench applicable to an imprint photolithography system. Background technique
[0002] Nano-devices include nano-electronic devices and nano-optoelectronic devices, which can be widely used in electronics, optics, micro-mechanical devices, new computers, etc. It is the most dynamic research field in the field of new materials and new devices. , intelligence, high integration and other mainstream development directions. Due to the potential huge market and national defense value of nano-devices, the methods, approaches and processes of its design and manufacture have become the research and investment hotspots of many scientists, governments and large enterprises. At present, the design and manufacture of nano-devices is in a period of rapid development, and there are various methods, and patterning technology is one o...