Fan-shaped gas inlet spray head for metal organic chemical vapor deposition equipment

A metal-organic substance and chemical deposition technology, which is applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., can solve problems affecting crystal quality, etc., and achieve the effect of improving crystal quality, improving uniformity, and eliminating pre-reaction

Inactive Publication Date: 2010-08-25
广东省中科宏微半导体设备有限公司
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Problems solved by technology

[0005] The nozzle design currently used in vapor deposition equipment can basically send two kinds of reaction gas sources into the reaction chamber separately, but they have m

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  • Fan-shaped gas inlet spray head for metal organic chemical vapor deposition equipment
  • Fan-shaped gas inlet spray head for metal organic chemical vapor deposition equipment
  • Fan-shaped gas inlet spray head for metal organic chemical vapor deposition equipment

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[0020] In the following, the technical solutions of the present invention will be further described in detail through embodiments and in conjunction with the drawings. In the specification, the same or similar reference numerals indicate the same or similar components. The following description of the embodiments of the present invention with reference to the accompanying drawings is intended to explain the general inventive concept of the present invention, and should not be understood as a limitation to the present invention.

[0021] The fan-shaped air inlet nozzle for metal organic chemical deposition equipment according to the present invention includes: a closed outer shell 1, which includes an upper plate 2, a middle layer 3, and a lower layer 4, between the upper and middle plates An intake chamber 5 for gas to enter is formed, and a cooling chamber 6 is formed between the middle plate and the lower plate. Among them: the intake chamber 5 is divided into a plurality of f...

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Abstract

The invention discloses a fan-shaped gas inlet spray head for metal organic chemical vapor deposition equipment, which comprises an enclosed shell body. The shell body comprises an upper plate, a middle plate and a lower plate; a gas inlet chamber for allowing the gas to enter is formed between the upper plate and the middle plate; a cooling chamber is formed between the middle plate and the lower plate; and the gas inlet chamber is divided into a plurality of fan-shaped areas isolated from one another. A plurality of heat-conducting thin tubes are fixed between the middle plate and the lower plate in each fan-shaped area, the thin tubes extend out of the cooling chamber in the height direction of the shell body, the open ends of the thin tubes are communicated with the gas inlet chamber, and the outlet ends of the thin tubes face the surface of an adjacent substrate; and mutually different reaction gases are introduced into at least two fan-shaped areas of the gas inlet chamber. The different reaction gases can be uniformly delivered to a reaction chamber through the fan-shaped areas. The pre-reaction can be reduced and the high-quality epitaxial growth of materials can be realized by controlling the rotational speed of the substrate, and a common epitaxial growth mode can be realized by improving the rotational speed of the substrate.

Description

technical field [0001] The invention relates to the technical field of semiconductor equipment manufacturing, in particular to a fan-shaped air inlet nozzle used in metal organic compound chemical deposition equipment. Background technique [0002] MOCVD (Metal Organic Chemical Vapor Deposition) equipment, that is, Metal Organic Chemical Vapor Deposition equipment, is the key equipment for the research and production of compound semiconductor epitaxial materials, especially suitable for large-scale industrial production of compound semiconductor functional structural materials, and cannot be replaced by other semiconductor equipment The core semiconductor equipment is the main means of producing semiconductor optoelectronic devices and microwave device materials in the world today, and is an indispensable strategic high-tech semiconductor equipment for the development of today's information industry and national defense high-tech breakthroughs. [0003] To grow thin film mat...

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Application Information

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IPC IPC(8): C23C16/455C23C16/18
Inventor 胡国新王晓亮冉军学肖红领殷海波张露李晋闽
Owner 广东省中科宏微半导体设备有限公司
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