Determination method and device for dry cleaning time and plasma processing apparatus
A technology of dry cleaning and determination method, which is applied in the field of plasma, can solve the problems of shortening the service life of equipment, reducing production efficiency, prolonging cleaning time, etc., and achieve the effect of improving system production efficiency, prolonging service life and high efficiency
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[0040] The core of the present invention is to use the characteristic that different compounds have the inherent infrared absorption wavelength corresponding to their characteristics, and the infrared spectrometer is used to monitor the infrared absorption spectrum of the attachments on the inner wall of the process chamber in real time, and the infrared absorption spectrum is the first in the infrared absorption spectrum. A time point is selected between the time corresponding to the sag point and the time corresponding to the second sag point, and it is used as the end time of the cleaning process of the cleaning gas. It should be pointed out here that the inner wall of the chamber mentioned in this application includes the side wall of the chamber and the quartz window above the chamber.
[0041] In order to enable those skilled in the art to better understand the technical solution of the present invention, a plasma processing device having a plasma processing chamber is taken...
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