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Plasma processing device and thimble lifting device thereof

A lifting device and plasma technology, applied in post-processing, post-processing details, crystal growth, etc., can solve problems such as complicated operation and poor leveling effect, and achieve the effects of improving reliability, avoiding lock-up, and ensuring accuracy

Active Publication Date: 2010-12-01
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, the device is complicated to operate during the leveling process and the leveling effect is poor

Method used

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  • Plasma processing device and thimble lifting device thereof
  • Plasma processing device and thimble lifting device thereof
  • Plasma processing device and thimble lifting device thereof

Examples

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Embodiment Construction

[0034] The core of the present invention is to provide a thimble lifting device, which can avoid the lateral deviation of the central guide rod during the lifting process, thus having high reliability. Another core of the present invention is to provide a plasma processing equipment including the above-mentioned thimble lifting device.

[0035] Please refer to Figure 4 , Figure 4 It is a structural schematic diagram of the first embodiment of the thimble lifting device provided by the present invention.

[0036]In the first specific embodiment, the thimble lifting device provided by the present invention includes a central guide rod 21 for connecting the thimble (not shown in the figure), and its lower end is movably connected to the outer end of the support arm 22, The inner end of the support arm 22 is fixedly connected with the output shaft of the driving part (not shown in the figure), and its extension direction is perpendicular to the direction of the above-mentioned...

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Abstract

The invention discloses a thimble lifting device which is used for a plasma processing device and comprises a central guide rod, at least two support arms for supporting the central guide rod and a driving part for driving the support arms to do vertical motion, wherein the upper end of the central guide rod is connected with a thimble, and the central guide rod is movably connected with the support arms so as to lead the support arms to be capable of changing the relative positions in the extension directions of the support arms. When the support arms produce the displacement in the horizontal direction during the lifting process due to various reasons, the support arms do not limit the degree of freedom of the central guide rod in the horizontal direction, so that the position change ofthe support arms in the horizontal direction can not affect the vertical motion of the central guide rod, the central guide rod is always kept vertical during the lifting process and the reliability of the device is improved.

Description

technical field [0001] The invention relates to the field of crystal processing, in particular to a thimble lifting device. The present invention also relates to a plasma processing equipment comprising the above-mentioned thimble lifting device. Background technique [0002] With the rapid development of my country's economic construction, the market demand for crystal components is increasing, which drives the rapid development of the crystal processing industry. [0003] At present, the process chamber for processing crystals generally has an electrostatic chuck inside, and the electrostatic chuck is used to support the crystal to be processed, and the lower part of the electrostatic chuck is provided with a lifting device, and a thimble for supporting a wafer is inserted into the lifting device. When processing crystals, the manipulator sends the wafer into the process chamber, and makes the wafer a certain distance above the upper surface of the electrostatic chuck; at...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B33/12H01L21/3065
Inventor 张小昂
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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