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Preparation process of tantalum bar for sputtering tantalum ring

A preparation process, a technology of tantalum rings, which is applied in the field of preparation process of tantalum strips for sputtering tantalum rings, can solve the problems of difficult to guarantee the consistency of material performance, low processing efficiency, low material utilization rate, etc., and achieve the consistency of material performance Easy to guarantee, improve processing efficiency, and easy to operate

Inactive Publication Date: 2010-12-22
NINGXIA ORIENT TANTALUM IND +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method has low material utilization rate, low processing efficiency, and it is difficult to guarantee the consistency of material performance.

Method used

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Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0012] The preparation process steps of the tantalum bar for the sputtering tantalum ring of the present invention are:

[0013] 1. Forging

[0014] Using the forging process of square first and then flattening, the total processing rate is 65% to 75% to ensure uniform grains.

[0015] 2. Heat treatment

[0016] In order to obtain a uniform and larger grain size, it is processed at a temperature of 1000°C to 1100°C, and the holding time is 60min to 120min.

[0017] 3. Billet rolling

[0018] Reverse rolling is adopted, and the total processing rate is 70% to 80%, so as to ensure uniform grain and rolled plate shape.

[0019] 4. The second heat treatment

[0020] Treat at a temperature of 1000°C to 1100°C, with a holding time of 60min to 120min.

[0021] 5. Finished product rolling

[0022] One-way rolling, the total processing rate is 70% to 80%, to ensure uniform grain and rolled plate shape.

[0023] 6. The third heat treatment

[0024] Treat under the temperature co...

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PUM

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Abstract

The invention relates to a preparation process of a tantalum bar for a sputtering tantalum ring, comprising the following steps: firstly forging the tantalum material by firstly squaring and then flattening the tantalum material, then carrying out heat treatment on the forged tantalum material at 1000-1100 DEG C, preserving the heat for 60-120min, carrying out break-down rolling by rolling in changed directions, carrying out reheat treatment at 1000-1100 DEG C, preserving the heat for 60-120min, carrying out finished product rolling by unidirectional rolling, finally carrying out third heat treatment at 1200-1400 DEG C, preserving the heat for 120-180min and carrying out leveling and blanking, thus obtaining the tantalum bar. The process can improve the material utilization ratio by 6%, improve the processing efficiency of the product because of simplifying the process and simultaneously easily ensure process consistency and material performance consistency of the product as the procedure requirements of pressure processing are easy to operate and control.

Description

technical field [0001] The invention belongs to the mechanical processing technology of tantalum materials, in particular to a preparation technology of tantalum strips for sputtering tantalum rings. Background technique [0002] Physical vapor deposition (PVD) is one of the most critical processes in the production process of semiconductor chips. Its purpose is to deposit metal or metal compounds in the form of thin films on silicon wafers or other substrates, and then through photolithography and corrosion etc. The cooperation of the process finally forms the complex wiring structure in the semiconductor chip. Physical vapor deposition is done by sputtering machine, and sputtering tantalum ring is a very important key consumable used in the above process. [0003] There are two main functions of sputtered tantalum rings in the semiconductor process: [0004] First: Restrict the trajectory of the sputtered particles and play a role in focusing; [0005] Second: It absorb...

Claims

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Application Information

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IPC IPC(8): B23P15/00
Inventor 李桂鹏张春恒同磊赵兵赵红运李兆博
Owner NINGXIA ORIENT TANTALUM IND
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