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FFS type TFT-LCD array substrate and manufacturing method thereof

An array substrate and substrate technology, applied in the field of thin film transistor liquid crystal display and its manufacturing, can solve the problems of common electrode delay and high production cost, and achieve the effects of reducing width, solving high production cost and reducing production cost

Active Publication Date: 2011-04-13
BOE TECH GRP CO LTD +1
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] The purpose of the present invention is to provide an FFS type TFT-LCD array substrate and its manufacturing method, which can effectively solve the technical defects of high production cost and common electrode delay of the existing structure

Method used

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  • FFS type TFT-LCD array substrate and manufacturing method thereof
  • FFS type TFT-LCD array substrate and manufacturing method thereof
  • FFS type TFT-LCD array substrate and manufacturing method thereof

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Embodiment Construction

[0070] The technical solutions of the present invention will be described in further detail below with reference to the accompanying drawings and embodiments. The film thickness and area size and shape of each layer in the accompanying drawings do not reflect the real proportion of the FFS type TFT-LCD array substrate, and the purpose is only to illustrate the content of the present invention.

[0071] figure 1 It is a plan view of the first embodiment of the FFS type TFT-LCD array substrate of the present invention, which reflects the structure of a pixel unit, figure 2 for figure 1 The cross-sectional view of A1-A1 in the middle, image 3 for figure 1 Sectional view of B1-B1 direction in the middle. Such as Figure 1 ~ Figure 3 As shown, the main structure of the FFS type TFT-LCD array substrate of the present invention includes gate lines 11, data lines 12, pixel electrodes 13, common electrodes 14, black matrix 9 and thin film transistors formed on the substrate 1, g...

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Abstract

The present invention relates to a FFS type TFT-LCD array substrate and a manufacturing method thereof, the array substrate comprises grid wires and data lines arranged on the substrate and defining a pixel area in which a pixel electrode, a thin film transistor, and a common electrode forming an edge electric field together with the pixel electrode are formed. The array substrate further comprises a black matrix prepared by metal thin film materials, and the black matrix is connected with the common electrode. The manufacturing method comprises forming the figures of the grid wires, the data wires, the pixel electrode and the thin film transistor; forming the figures of the common electrode and the black matrix which is prepared by metal thin film materials and connected with the common electrode. According to the invention, the figure of the black matrix is arranged on the array substrate and the black matrix is connected with the common electrode, which makes the black matrix block a light leak area effectively, and serve as a connection bus of the common electrode. The invention can effectively solve the problems of high production cost of present structure and the technical defect of the delay of the common electrode.

Description

technical field [0001] The invention relates to a thin film transistor liquid crystal display and a manufacturing method thereof, in particular to an FFS type TFT-LCD array substrate and a manufacturing method thereof. Background technique [0002] In Thin Film Transistor Liquid Crystal Display (TFT-LCD) products, Fringe Field Switching (FFS) is one of the technologies that can improve LCD image quality in recent years. At the same time, the requirements of high penetration and large viewing angle are achieved. At present, the main structure of the FFS type TFT-LCD in the prior art includes an array substrate and a color filter substrate that are boxed together and the liquid crystal is sandwiched between them. The array substrate is formed with gate lines, data lines, pixel electrodes, thin film transistors and bar The common electrode of the shape structure, the color resin pattern and the black matrix pattern are formed on the color filter substrate, and the black matrix...

Claims

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Application Information

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IPC IPC(8): G02F1/1362G02F1/1368G02F1/1333H01L21/82G03F7/00
Inventor 金原奭金永珉金馝奭
Owner BOE TECH GRP CO LTD
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