Method of producing an optical device
A technology of optical devices and porous films, applied in the direction of optical components, optics, instruments, etc., can solve the problems of reduced density, reduced thickness, and inability to obtain optical characteristics, and achieve low-cost effects
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Embodiment 1
[0032] Figure 1A represents the sputter deposition system according to Example 1. The system forms an optical film by sputtering a metal target and reacting the metal with a reactive gas flowing into a chamber of the system. Targets of various shapes may be provided in the target unit 100 depending on usage. Example 1 used a ring-shaped target to form a film, but a target having a different shape may be used to form a film. This sputter deposition system is capable of forming a film while changing the position of the target unit 100 relative to the optical device substrate 101 , which means that thickness unevenness across the entire plane of the substrate 101 can be adjusted as needed.
[0033]In the film forming step, a Mg metal target was set in the target unit 100, a unit having an opening was connected in front of the target unit 100 (substrate side), and the rear side was ground in a vacuum antechamber 102. A synthetic quartz substrate that was machined and had a thic...
Embodiment 2
[0042] MgF was formed on a synthetic quartz substrate by sputtering in the same manner as in Example 1 2 membrane. The resulting porous film was immersed in pure water heated to 50°C. MgF with respect to immersion time 2 The refractive index of the film is shown in Figure 4 middle. As in Example 1, under N as a dry atmosphere 2 The reflectance of the film was measured in a purge atmosphere, and the refractive index was calculated from the measured reflectance.
[0043] Depend on Figure 4 The graph of the graph confirms the reduction of the refractive index as in the water immersion treatment of Example 1. It was also confirmed from this graph that the rate of decrease in the refractive index was improved by increasing the temperature of the liquid in which the film was immersed.
Embodiment 3
[0045] A synthetic quartz substrate ground on each side and having a thickness of 2 mm was prepared. Sputtering is used to form a dense six-layer film on each side of the substrate in which MgF 2 membrane and LaF 3 The films are stacked alternately with each other. On the six-layer film on each side of the substrate, MgF 2 A film is formed as the topmost layer. Then, using a spectroscope to measure the N 2 Dry topmost MgF in purging environment 2 Spectral reflectance properties of films to calculate MgF 2 The refractive index of the film. As each six-layer film was formed, the reflectance was measured and the thickness and other properties of the film were calculated. The MgF of Example 1 was formed by building on a film whose properties had been calculated 2 A model of the film, from which the refractive index is calculated by simulation. Calculated topmost MgF 2 The filling factor of the film was 0.72. The absorbance (absorbance) of the film was also measured usin...
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