Coating device
A technology of coating device and reaction device, applied in gaseous chemical plating, metal material coating process, coating and other directions, can solve problems such as limiting production efficiency, unable to meet mass and rapid production, etc., and achieve the effect of improving efficiency
Inactive Publication Date: 2013-08-28
HONG FU JIN PRECISION IND (SHENZHEN) CO LTD +1
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Problems solved by technology
[0003] However, this coating method can generally only coat a circular substrate to be coated, which limits the production efficiency and cannot meet the requirements of mass and rapid production
Method used
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[0043] Please also refer to figure 1 and figure 2 , is the coating device 100 provided by the present invention, and the coating device 100 includes a housing 10 , a reaction device 20 and a closing cover 30 .
[0044] The housing 10 is a hexagonal prism sleeve with one end closed. The housing 10 includes a bottom wall 11 , an open end 12 , a side wall 13 , a plurality of supporting plates 14 and a reaction chamber 15 . The bottom wall 11 and the opening 12 are located at two opposite ends of the housing 10 . A shaft hole 110 is defined at the center of the bottom wall 11 . The side wall 13 is vertically fixed on the edge of the bottom wall 11 to enclose the reaction chamber 15 . The carrying plate 14 is fixed on the inner side of the side wall 13 along the circumferential direction of the housing 10. The carrying plate 14 is a strip-shaped thin plate, and the carrying plate 14 is provided with an accommodation for accommodating the substrate to be coated. groove 141, an...
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The invention provides a coating device used for coating substrates to be coated. The coating device comprises a shell with a reaction chamber, a reaction device, first and second air inlet pipes and an air outlet pipe, wherein the side wall of the reaction chamber is provided with a plurality of accommodating grooves for accommodating a plurality of substrates to be coated; the reaction device is accommodated in the shell and can rotate in the reaction chamber; the reaction device is cylindrical and comprises a first accommodating chamber and a plurality of electromagnets; the reaction device is provided with a plurality of first nozzles communicated with the first accommodating chamber and the reaction chamber along the axial direction; a microwave pipeline for conducting microwaves, which is formed in the axial direction of the reaction device, is communicated with each first nozzle; the first and second air inlet pipes are communicated with the first accommodating chamber; the airoutlet pipe is communicated with the reaction cavity; and the plurality of electromagnets are positioned on two sides of the plurality of first nozzles and are used for applying a magnetic field to plasmas formed by the microwaves so as to generate electron cyclotron resonance. The substrates to be coated can be coated by the rotating reaction device, and the coating efficiency is improved.
Description
technical field [0001] The invention relates to a coating device. Background technique [0002] When the existing electron cyclotron resonance microwave plasma coating is used, the reaction gas is introduced from the top of the reaction chamber, and then the microwave is generated by the microwave generator, which is introduced into the reaction chamber through the waveguide, and the microwave is above the substrate to be coated in the reaction chamber A standing wave is formed to excite the reactive gas to generate a plasma. At the same time, two sets of electromagnets are placed on the periphery of the reaction chamber. The electromagnets can make the electrons gyrate, further improving the efficiency of plasma generation, so that the reaction gas in the plasma state can form a film structure on the substrate to be coated. [0003] However, this coating method can generally only coat a circular substrate to be coated, which limits the production efficiency and cannot meet...
Claims
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IPC IPC(8): C23C16/54C23C16/513
Inventor 裴绍凯
Owner HONG FU JIN PRECISION IND (SHENZHEN) CO LTD