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Vacuum pumping device, vacuum processing device, and vacuum processing method

A technology of vacuum exhaust and vacuum treatment, applied in liquid variable volume machinery, machines/engines, mechanical equipment, etc., can solve the problems of vacuum treatment devices that cannot be continuously exhausted, and it is difficult to predict the operation time.

Active Publication Date: 2014-06-25
ULVAC CRYOGENICS +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, since the vacuum processing device cannot be continuously exhausted during regeneration, the vacuum processing has to be stopped repeatedly.
In addition, since there is no detection method for directly and quantitatively detecting the amount of ozone generated in the vacuum processing environment, it is difficult to predict the operating time of the device (continuous exhaust time of the cryopump) when ozone accumulates to a certain amount

Method used

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  • Vacuum pumping device, vacuum processing device, and vacuum processing method
  • Vacuum pumping device, vacuum processing device, and vacuum processing method
  • Vacuum pumping device, vacuum processing device, and vacuum processing method

Examples

Experimental program
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Effect test

no. 1 Embodiment approach

[0088] figure 1 It is a side cross-sectional view showing a schematic structure of a vacuum processing apparatus 1 according to an embodiment of the present invention. The vacuum processing apparatus 1 of this embodiment has a vacuum chamber 10 . The vacuum chamber 10 has a processing chamber 11 for processing the substrate W, a pump chamber 12 for exhausting the processing chamber 11 , and a pipe 13 connected between the processing chamber 11 and the pump chamber 12 . The entire vacuum tank 10 is made of a metal material such as aluminum or stainless steel.

[0089] In the present embodiment, the piping 13 forms an exhaust passage 13A that guides the processing gas to be exhausted from the processing chamber 11 to the pump chamber 12 . The pipe 13 is composed of a first pipe member 131 and a second pipe member 132 . The first pipe member 131 is connected to the processing chamber 11 , and the second pipe member 132 is connected to the pump chamber 12 . Furthermore, a val...

no. 2 Embodiment approach

[0114] figure 2 It is a side cross-sectional view showing a schematic configuration of a vacuum processing apparatus 2 according to a second embodiment of the present invention. In the figure, it is opposite to the above-mentioned vacuum processing device 1 ( figure 1 ) are marked with the same symbols, and their detailed text descriptions are omitted.

[0115] The vacuum processing apparatus 2 of this embodiment is the same as the above-mentioned vacuum processing apparatus 1 in that the heating unit 20 for decomposing ozone in the exhaust gas is arranged in the exhaust passage 13A, and the heating unit 20 is arranged The valve chamber 14 is different from the vacuum processing apparatus 1 described above.

[0116] The heating unit 20 has a plurality of heaters 21 arranged at regular intervals in a direction intersecting the axial direction of the exhaust passage 13A. The size, number, and position of the heater 21 (heating element 211 ) are not particularly limited, and...

no. 3 Embodiment approach

[0121] image 3 It is a side cross-sectional view showing a schematic configuration of a vacuum processing apparatus 3 according to a third embodiment of the present invention. In the figure, it is opposite to the above-mentioned vacuum processing device 1 ( figure 1 ) are marked with the same symbols, and their detailed text descriptions are omitted.

[0122] The vacuum processing apparatus 3 of this embodiment is the same as the above-mentioned vacuum processing apparatus 1 in that the heating unit 20 for decomposing ozone in the exhaust gas is arranged in the exhaust passage 13A, and the heating unit 20 is arranged It is different from the above-mentioned vacuum processing apparatus 1 in that the second pipe member 132 is inside.

[0123] The heating unit 20 has a plurality of heaters 21 arranged at regular intervals in a direction intersecting the axial direction of the exhaust passage 13A. The size, number, and position of the heater 21 (heating element 211 ) are not p...

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Abstract

Provided are a vacuum pumping device, a vacuum processing device, and a vacuum pumping method capable of preventing accumulation of ozone in a cryopump. A vacuum processing device (1) pertaining to an embodiment of the invention is equipped with a processing chamber (11) for vacuum processing, a pump unit for exhausting the processing chamber (11), and a heating unit (20). The pump unit has a cold trap (161) capable of collecting the exhaust gas and an exhaust pathway (13A) for leading the exhaust gas from the processing chamber (11) to the cold trap (161). The heating unit (20) pyrolyzes ozone contained in the exhaust gas while it is in the exhaust pathway (13A) on the way to the cold trap (161) from the processing chamber (11).

Description

technical field [0001] The present invention relates to a vacuum exhaust device using a cryopump, a vacuum processing device, and a vacuum processing method. Background technique [0002] A cryopump is well known as a high-vacuum exhaust pump, and is used in a vacuum processing device for film formation, surface modification, semiconductor pattern drawing, analysis, evaporative drying, and the like. The cryopump is used to facilitate the discharge of water molecules, and in principle it is easier to obtain a clean vacuum environment. That is, the vacuum processing device is a collection type pump, which can condense or adsorb the gas put into the vacuum processing device and the processing gas introduced into the vacuum processing device at a low temperature, so that the gas and the processing gas are kept in a vacuum. The principle "exhaust" is realized in the state inside the treatment device. Therefore, it is necessary to periodically perform an operation (regeneration)...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): F04B37/16F04B37/08F04B37/18
CPCF04B37/08F04B37/18F04B37/16
Inventor 小室拓增田行男降矢新治斋藤一也大园修司浅利伸
Owner ULVAC CRYOGENICS