Electron beam generating apparatus

一种电子束发射、电子束的技术，应用在放电管电子枪、电路、放电灯等方向，能够解决电子束发射度增大、电子束质量下降、耦合器电场失去均衡性等问题，达到减少发射度、均衡性改善的效果

Inactive Publication Date: 2011-09-14
POSTECH ACAD IND FOUND
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the coupling hole causes the electric field inside the coupler to lose balance
The loss of balance of the electric field increases the emissivity of the electron beam, resulting in a decrease in the quality of the electron beam

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Electron beam generating apparatus
  • Electron beam generating apparatus
  • Electron beam generating apparatus

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0044] Hereinafter, exemplary embodiments of the present invention will be described with reference to the accompanying drawings. However, the described embodiments of the present invention may be changed into some other forms, and the scope of the present invention should not be construed as being limited to the following embodiments. The embodiments of the present invention are intended to more fully explain the present invention for those skilled in the art. Therefore, the shapes and the like of elements shown in the drawings are exaggerated to emphasize differentiated illustrations, and elements identified by the same reference numerals in the drawings represent the same elements.

[0045] There is a need for a device for generating electron beams with high power but low emittance. The emittance ε has three components and is represented by Equation 1 shown below:

[0046] [equation 1]

[0047] ϵ = ϵ th ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The present invention relates to an electron beam generating apparatus capable of reducing the emittance of an electron beam. For this purpose, the electron beam generating apparatus according to the present invention comprises: a housing having a rear surface portion for generating an electron beam, a front surface portion having an electron beam emitting hole for emitting the generated electron beam to the outside, and a side surface portion for interconnecting the rear surface portion and the front surface portion, wherein the side surface portion has a first hole, and the opposite side surface portion facing said side surface with the first hole has a second hole to reduce an electric field imbalance caused by the first hole; and a waveguide arranged at the side surface portion to supply electromagnetic waves into the housing through the first hole.; The laser beam applied into the housing generates an electron beam, and the thus-generated electron beam is accelerated by the electromagnetic waves supplied into the housing.

Description

technical field [0001] The present invention relates to an apparatus for generating electron beams by using laser light. Background technique [0002] Generally, an electron gun refers to a device that converges electron currents in a thin beam for discharge, such as an electron microscope, a traveling wave tube, a Braun tube, and the like. [0003] Prior art electron guns use electromagnetic waves to accelerate the electron beam through the coupler interior. That is, electromagnetic waves are made incident inside the coupler through the coupling hole formed in the coupler. However, the coupling hole causes the electric field inside the coupler to lose balance. The loss of balance of the electric field increases the emissivity of the electron beam, resulting in a decrease in the quality of the electron beam. Contents of the invention [0004] technical problem [0005] Accordingly, it is an object of the present invention to provide an electron beam generating device c...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): H01J23/06H01J23/20
CPCH01J3/02H01J3/021H01J37/06H01J23/12H01J37/32229H01J7/16
Inventor 朴龙云朴成柱高仁洙金昶范洪周浩文成益
Owner POSTECH ACAD IND FOUND
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap