MOCVD (Metal-organic Chemical Vapor Deposition) system with multiple extensional reaction cavities and operation method thereof

An operation method and reaction chamber technology, applied in the field of MOCVD systems, can solve the problems of inability to meet the needs of large-scale epitaxial substrate production, increase costs and operating costs, and low output, so as to prolong the cleaning and maintenance cycle, shorten the Preparation time, the effect of increasing production
CN102212877BActive Publication Date: 2012-08-22JIANGSU ZHONGSHENG SEMICON EQUIP
0 Cites 1 Cited by

Patent Information

Authority / Receiving Office
CN ยท China
Patent Type
Patents(China)
Current Assignee / Owner
JIANGSU ZHONGSHENG SEMICON EQUIP
Publication Date
2012-08-22

Smart Images

  • Figure 1
    Figure 1
  • Figure 2
    Figure 2
  • Figure 3
    Figure 3
Patent Text Reader

Abstract

The invention discloses an MOCVD (Metal-organic Chemical Vapor Deposition) system with multiple extensional reaction cavities, and the system provided by the invention is used for carrying out extensional reaction on a plurality of substrates arranged on a tray. The MOCVD system comprises a transmission cavity provided with a mechanical arm, a plurality of transit stations and at least two extensional reaction cavities, wherein the plurality of transit stations are connected with the transmission cavity; the substrates can be simultaneously subjected to extensional reaction in the extensionalreaction cavities; and according to mechanical automation operation, the trays in the extensional reaction cavities can be taken out and put in without opening extensional reaction cavity covers, thereby improving the system capacity, saving the time for cooling the extensional reaction cavities and changing trays, and improving the production use ratio of equipment. Because the plurality of extensional reaction cavities share one set of transmission cavity, mechanical arm and the like, one and several other sets of corresponding equipment are saved, the setup cost and operation cost are lowered, and installing sites of the equipment are saved. Because the transit stations have the function of a pre-processing cavity, the tray can be precooled and preheated according to the production requirement so as to further improve the production efficiency.
Need to check novelty before this filing date? Find Prior Art

Description

technical field

[0001] The invention relates to a MOCVD (metal organic chemical vapor deposition) system and its operating method for producing compound semiconductor optoelectronic devices, in particular to an MOCVD system with multiple epitaxial reaction chambers and its operating method. Background technique

[0002] Metal-organic chemical vapor deposition system (hereinafter referred to as MOCVD system) is the core equipment used to produce semiconductor optoelectronic devices. The substrate substrate is grown in the MOCVD chamber through the epitaxial process structure to form a specialized optoelectronic device structure. Currently, MOCVD is It is widely used in the production of LED epitaxial wafers, high-power lasers and high-efficiency solar cells.

[0003] In the past, due to market and technical reasons, the requirements for the output of epitaxial wafers were not high, and MOCVD equipment was designed for small-scale production. Such as figure 1 As shown, it is...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More