Deposition material supply apparatus and substrate treatment apparatus having the same
A technology for a substrate processing device and a supply device, which is applied to lighting devices, metal material coating processes, ion implantation plating, etc., can solve problems such as deterioration of raw materials, and achieve the effect of prolonging the operation stop period and improving the process efficiency.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0031] Hereinafter, specific embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, the present invention may be embodied in different forms and should not be construed as limited to the embodiments described herein. Rather, reference to these embodiments is intended so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art.
[0032] figure 1 is a schematic diagram of a substrate processing system including a substrate processing apparatus, according to an example embodiment. figure 2 It is a cross-sectional view of the substrate processing apparatus.
[0033] see figure 1 and figure 2 , the substrate processing system is used to rapidly process a large number of substrates 10 in an in-line manner. The substrate processing system includes: a loading part 1000 on which the substrate 10 is loaded; an unloading part 5000 spaced from the ...
PUM
| Property | Measurement | Unit |
|---|---|---|
| diameter | aaaaa | aaaaa |
| diameter | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 