Unlock instant, AI-driven research and patent intelligence for your innovation.

Deposition material supply apparatus and substrate treatment apparatus having the same

A technology for a substrate processing device and a supply device, which is applied to lighting devices, metal material coating processes, ion implantation plating, etc., can solve problems such as deterioration of raw materials, and achieve the effect of prolonging the operation stop period and improving the process efficiency.

Inactive Publication Date: 2011-10-12
SNU PRECISION CO LTD
View PDF3 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In this case, it is necessary to increase the heat generated by the heating means to heat a larger tank for storing and vaporizing the raw material, thereby causing deterioration of the raw material to be deposited

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Deposition material supply apparatus and substrate treatment apparatus having the same
  • Deposition material supply apparatus and substrate treatment apparatus having the same
  • Deposition material supply apparatus and substrate treatment apparatus having the same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0031] Hereinafter, specific embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, the present invention may be embodied in different forms and should not be construed as limited to the embodiments described herein. Rather, reference to these embodiments is intended so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art.

[0032] figure 1 is a schematic diagram of a substrate processing system including a substrate processing apparatus, according to an example embodiment. figure 2 It is a cross-sectional view of the substrate processing apparatus.

[0033] see figure 1 and figure 2 , the substrate processing system is used to rapidly process a large number of substrates 10 in an in-line manner. The substrate processing system includes: a loading part 1000 on which the substrate 10 is loaded; an unloading part 5000 spaced from the ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
diameteraaaaaaaaaa
Login to View More

Abstract

Provided are a deposition material supplying device and a substrate processing apparatus including the deposition material supplying device, which store a large amount of organic material without deteriorating the organic material and vaporize a desired amount of the organic material to a substrate. The deposition material supplying device includes: a pot in which a storage space filled with raw material communicates with a vaporization space where the raw material is vaporized; a transporting unit configured to continuously or periodically transport the raw material filling the storage space to the vaporization space; a heating unit disposed on an outside of the vaporization space of the pot to supply heat vaporizing the raw material; and a cooling unit disposed on an outside of the storage space to prevent the raw material stored in the storage space from being thermally deteriorated.

Description

technical field [0001] The present invention relates to a deposition material supply apparatus and a substrate processing apparatus having the deposition material supply apparatus, and more particularly, to a deposition material supply apparatus and a substrate processing apparatus including the deposition material supply apparatus , the deposition material supply device stores a large amount of organic material and vaporizes a desired amount of the organic material to the substrate without deteriorating the organic material. Background technique [0002] Since organic light emitting devices (OLEDs) are different from self-luminous devices of liquid crystal display devices, they do not need a backlight, so their power consumption is low. In addition, since the organic light emitting device has a wide viewing angle and a high response speed, a display device including the organic light emitting device can display an improved image with a wide viewing angle without residual im...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/24H05B33/10
CPCC23C14/12C23C14/243C23C14/544C23C14/24H05B33/10
Inventor 尹亨硕崔上和孙成官姜敞晧权铉九南宫晟泰韩垧录
Owner SNU PRECISION CO LTD