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Internal vapour deposition process

A technology of internal vapor deposition and gas flow, which is used in the manufacture of optical fibers and the manufacture of final preforms for optical fibers, which can solve problems such as signal strength reduction

Active Publication Date: 2011-10-19
DRAKA COMTEQ BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0016] During the delivery of light through an optical fiber, several factors cause the signal strength (light capacity) to decrease

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0098] Using a PCVD-like internal vapor deposition process, by means of figure 1 with figure 2 The apparatus shown schematically in , produces five primary preforms for gradient index multimode optical fibers.

[0099] During the internal vapor deposition process, a certain amount of fluorine-containing compound, more specifically C 2 f 6 Feed to the hollow glass substrate tube 2 is only provided while the reaction zone 7 is moving in the direction of the discharge side 4 . This is done by placing the valve 11 in the "closed" position when the reaction zone moves in the direction of the supply side 3 and in the "open" position when the reaction zone 7 moves in the direction of the discharge side 4 . Gas stream 8 does not include any fluorine-containing compounds.

[0100] To form a solid primary preform, after completion of the internal vapor deposition process, each of the five hollow glass substrate tubes with deposited glass layers therein was collapsed using a heat so...

Embodiment 2

[0105] Using a PCVD-like internal vapor deposition process, by means of figure 1 with figure 2 The apparatus schematically shown in , produces five primary preforms for graded-index multimode fiber.

[0106] During the internal vapor deposition process, a certain amount of fluorine-containing compound, more specifically C 2 f 6 The hollow glass substrate tube 2 is only supplied when the reaction zone 7 is moved in the direction of the supply side 3 . This is done by placing the valve 11 in the "closed" position when the reaction zone moves in the direction of the discharge side 4 and in the "open" position when the reaction zone 7 moves in the direction of the supply side 3 . Gas stream 8 does not include any fluorine-containing compounds. In Example 2, the concentration of the fluorine-containing compound in the gas flow 8 when the reaction zone moves in the direction of the supply side is set to the same value as that in Example 1 when the reaction zone moves in the dir...

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Abstract

The invention relates to an internal vapour deposition process. A method for manufacturing a primary preform for optical fibres using an internal vapour deposition process, including the steps of: i) providing a hollow glass substrate tube having a supply side and a discharge side, ii) surrounding at least part of the hollow glass substrate tube by a furnace, iii) supplying doped or undoped glass-forming gases to the interior of the hollow glass substrate tube via the supply side thereof, iv) creating a reaction zone in which conditions such that deposition of glass will take place on the interior of the hollow glass tube are created, and v) moving the reaction zone back and forth along the length of the hollow glass substrate tube between a reversal point located near the supply side and a reversal point located near the discharge side of the hollow glass substrate tube, wherein, during at least part of step v), the gas flow comprises a first concentration of fluorine-containing compound when the reaction zone is moving in the direction of the discharge side.

Description

technical field [0001] The present invention relates to a method of manufacturing a primary preform for optical fiber using an in-house vapor deposition process, said method comprising the steps of: [0002] i) providing a hollow glass substrate tube with a supply side and a discharge side, [0003] ii) the hollow glass substrate tube is at least partially surrounded by a heating furnace, [0004] iii) feeding doped or undoped glass-forming gas into the interior of the hollow glass substrate tube via the supply side of the hollow glass substrate tube, [0005] iv) creating a reaction zone in which conditions are created such that glass deposition occurs inside the hollow glass substrate tube, and [0006] v) reciprocating the reaction zone along the length of the hollow glass substrate tube between a reversal point located near the supply side of the hollow glass substrate tube and a reversal point located near the discharge side of the hollow glass substrate tube, wherein ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03B37/018C03B37/025
CPCC03B37/01807C03B37/0183C03B2201/12C03B2201/24C03B2201/28C03B2201/31C03B2201/32C03B2201/42
Inventor I·米莉瑟维克M·J·N·范·斯特劳伦J·A·哈特苏克E·阿尔迪
Owner DRAKA COMTEQ BV