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Zero adjusting device for focusing and leveling measurement system

A measurement system and zero adjustment technology, applied in the field of zero adjustment devices, can solve the problems of motors not being able to meet the rotation accuracy, complicated processing, and high manufacturing costs, and achieve the effect of simplifying the steps of optical-mechanical assembly and adjustment and simplifying the mechanical structure

Active Publication Date: 2014-05-21
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] The above two structures have their own disadvantages: in the first structure, the motor cannot meet the requirements of the increasing rotation accuracy, resulting in limited adjustment accuracy; in the second structure, in order to maintain the rotation accuracy, while reducing the accuracy of the stepping motor Requirements, the cam structure is adopted; the disadvantage is that the processing is complicated and the manufacturing cost is high

Method used

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  • Zero adjusting device for focusing and leveling measurement system
  • Zero adjusting device for focusing and leveling measurement system
  • Zero adjusting device for focusing and leveling measurement system

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Embodiment Construction

[0026] In order to better understand the technical content of the present invention, specific embodiments are given together with the attached drawings for description as follows.

[0027] The invention provides a zero position adjustment device for focusing and leveling measurement system, which has simple structure, convenient operation and low cost.

[0028] Please refer to image 3 , image 3 Shown is a schematic structural diagram of the zero position adjustment device in a preferred embodiment of the present invention. The present invention proposes a zero adjustment device for focusing and leveling measurement system, including: a light source 10, a projection slit 30, a reflector group 20, a detection slit 50 and a photodetector 60, the reflector group 20 Including the third reflector 21 and the first reflector 22 at the incident end, and the second reflector 23 and the fourth reflector 24 at the exit end; the light beam 100 emitted by the light source 10 is reflecte...

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Abstract

The invention provides a zero adjusting device for a focusing and leveling measurement system. The zero adjusting device comprises a light source, a projection slit, a reflector set, a detection slit and a photoelectric detector; the reflector set comprises a first reflector at the incident end and a second reflector at the emergent end; beams emitted by the light source are vertically emitted to the projection slit, and then the beams are reflected to a measurement silicon chip through the first reflector; and the measurement silicon chip reflects the beams to the second reflector, the beams reflected by the second reflector are emitted to the detection slit, and then the emergent beams enter the photoelectric detector and are measured, wherein the second reflector is controlled by a motor driver to move along the normal direction of the second reflector. The zero adjusting device for the focusing and leveling measurement system has simple structure, is convenient to operate, and has low cost.

Description

technical field [0001] The invention relates to a focusing and leveling measurement system, and in particular to a zero position adjustment device for the focusing and leveling measurement system. Background technique [0002] The focusing and leveling sensor system is one of the lithography subsystems. The purpose is to use the focusing and leveling sensor to measure the height of a single point or multiple points of the silicon wafer, so as to obtain the defocus amount of the silicon wafer relative to the best focal plane of the projection objective lens. , the amount of inclination, and as the input feedback signal of the vertical control system of the workpiece table. [0003] When the focal plane of the projection objective lens drifts, if the focal plane position is not corrected and compensated, the center of the measurement point for focusing and leveling will not coincide with the exposure field of view of the projection objective lens, causing measurement errors. ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
Inventor 严兵陈飞彪张冲贾翔
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD