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Continuous Diffusion Processor

A technology for diffusion treatment and treatment of parts, applied in the field of continuous diffusion treatment devices, can solve problems such as the bad influence on the quality of the treated parts, and achieve the effect of suppressing dust

Inactive Publication Date: 2011-12-28
KOYO THERMO SYST CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, since the chain slides on the track in the heating furnace when conveying the workpiece, dust is generated from one or both of the chain and the rail due to wear, which may have a bad influence on the quality of the workpiece to be treated by diffusion treatment.

Method used

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Experimental program
Comparison scheme
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Embodiment Construction

[0039] Embodiments of the present invention will be described below with reference to the drawings.

[0040] [1. About the overall structure]

[0041] figure 1 It is a perspective view of the continuous diffusion processing apparatus of the present invention. The continuous diffusion treatment device is used to carry out diffusion treatment on the object to be treated. For example, the continuous diffusion processing apparatus is used to attach impurities composed of predetermined elements to the surface of a silicon wafer (processed object) and diffuse the impurities to the surface of a solar cell unit using crystalline silicon. inside of the wafer. exist figure 1 The description of the object to be processed is omitted in .

[0042] The continuous diffusion processing device comprises: a conveying table 50, which places a plurality of plate-shaped objects to be processed; a cylindrical heating furnace 1; a conveying device 2, which conveys a plurality of conveying table...

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Abstract

PROBLEM TO BE SOLVED: To provide a continuous diffusion processing apparatus that can suppress occurrence of powder dust having an adverse effect on the processing quality of a target object when the target object is fed.SOLUTION: A continuous diffusion processing apparatus has a feeding table 50 on which plural plate-like processing targets W are mounted, a barrel-type heating furnace 1 extending linearly from a feed-in portion for feeding in the feeding table 50 to a feed-out portion for feeding out the feeding table 50, a feeding device 2 for successively feeding the feeding table 50 into the heating furnace 1 and successively feeding out the feeding table 50 from the heating furnace 1, a heating device 3 for heating the processing targets W mounted on the feeding table 50 passing through the heating furnace 1 and a gas supply device 41 for supplying gas into the heating furnace 1 for diffusion processing. The feeding table 50 has a wheel portion 52 rolling along the bottom surface of the heating furnace 1 by a rolling bearing 60.

Description

technical field [0001] The invention relates to a continuous diffusion treatment device. Background technique [0002] For example, in the process of manufacturing solar cells using crystalline silicon, it is necessary to carry out diffusion treatment, that is, to make impurities composed of specified elements adhere to the surface of a silicon-made object (wafer) and diffuse the impurities to the surface of the object to be processed. inside of the piece. As a diffusion processing apparatus for performing the above-mentioned diffusion processing, there is, for example, a batch type. This batch type apparatus includes a heating furnace for heating workpieces, and the size of the furnace is only large enough to accommodate a tray on which a plurality of workpieces are loaded. [0003] After the object to be processed is sent into the heating furnace, the gas containing impurities is supplied into the heating furnace, and the temperature in the heating furnace is raised to d...

Claims

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Application Information

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IPC IPC(8): H01L21/22H01L21/677H01L21/68C30B31/06C30B31/16
Inventor 森川清彦笠次克尚西村圭介芦田忍
Owner KOYO THERMO SYST CO LTD