Solar cell reactive ion etching (RIE) technology temperature compensation method
A solar cell and temperature compensation technology, which is applied in circuits, electrical components, sustainable manufacturing/processing, etc., can solve problems such as the impact on the electrical performance of cells, and achieve the effect of improving stability
Active Publication Date: 2012-02-29
TRINA SOLAR CO LTD
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Problems solved by technology
This will affect the electrical performance of the final cell
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Embodiment 1
[0041] When the system initially sets the process time T 0 = 65;
[0042] a=50.34;
[0043] b=172.54;
[0044] When the temperature T1 = 34 degrees, the actual process time calculated by the formula is 70s, and the RIE equipment uses the actual process time to perform the texturing operation;
[0045] When the temperature T1 = 37.55 degrees, the actual process time calculated by the formula is 75s, and the RIE equipment uses this actual process time to perform the texturing operation.
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The invention relates to a solar cell reactive ion etching (RIE) texturing technology field and especially relates to a solar cell reactive ion etching (RIE) technology temperature compensation method. The method is characterized in that: firstly, before each operation, a substrate temperature is detected through a thermocouple or an infrared temperature detector; then a temperature value is fed back to an operation system; the system calculates actual technology time according to the temperature value, wherein a technology time calculation formula is as follows: T=T0+a*In(T1)+b; T is the technology time after compensation; T0 is the set technology time; T1 is the substrate temperature; the a and the b are constants which are calculated according to the collected temperature and technology time data; finally, when equipment works, the actual technology time is the technology time after the compensation. By using method of the invention, reflectivity in the RIE technology is not fluctuated as the technology temperature. Through introducing the temperature compensation, the technology time can be adjusted automatically. RIE technology stability can be raised.
Description
technical field [0001] The invention relates to the technical field of solar cell RIE texturing, in particular to a solar cell RIE process temperature compensation method. Background technique [0002] Reactive Ion Etching (RIE) is an etching that combines (1) physical ion bombardment and (2) chemical reaction. This method has the dual advantages of anisotropy and high etching selectivity. The etching is mainly achieved by chemical reaction to obtain high selectivity. Adding ion bombardment has two functions: one is to destroy the atomic bond on the surface of the etched material to accelerate the reaction rate. The second is to knock off the product or polymer (Polymer) redeposited on the etched surface, so that the etched surface can be in contact with the etching gas again. The achievement of anisotropic etching depends on redeposited products or polymers, which are deposited on the etching pattern, and the deposits on the surface can be removed by ions, so the etching ...
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IPC IPC(8): H01L31/18
CPCY02P70/50
Inventor 钟明
Owner TRINA SOLAR CO LTD