Low-toxin low-harm nail polish

A technology of nail polish and carboxymethyl cellulose, applied in the field of daily chemical industry, to achieve the effect of good stability

Inactive Publication Date: 2012-04-18
汕头市乾力知识产权代理有限公司
View PDF0 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The technical problem to be solved by the present invention is to provide a nail polish with low toxicity and little harm to the human body. While preserving the function of the nail polish, the present invention can also reduce the high toxicity and harm to the human body caused by the old formula nail polish. Big downside, with broader market functionality

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0008] Add 7.7kg of deionized water to the reaction kettle, heat to 75°C, add 79.5kg of vinyl acetate-butenoic acid (crotonic acid)-branched vinyl decanoate copolymer, 0.8kg of carboxymethyl cellulose, ethanol 2kg, glycerin 4kg, after the materials are completely dissolved, wait until the temperature drops to 50°C, add 6kg of bone collagen and keratin hydrolyzate, stir and dissolve to obtain the finished product.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a low-toxin low-harm nail polish. The low-toxin low-harm nail polish consists of the following raw materials in percentage by weight: 79.5% of vinyl acetate-butenoic acid (crotonic acid)-branched-chain vinyl decanoate copolymer, 0.8% of carboxymethylcellulose, ossein, 6% of keratin hydrolysate, 2% of ethanol, 4% of glycerol and 7.7% of deionized water. In the invention, the vinyl acetate-butenoic acid (crotonic acid)-branched-chain vinyl decanoate copolymer serves as a major raw material; compared with products which mainly consist of nitrocellulose with the addition of chemical solvents such as acetone, acetic ether, ethyl lactate, phthalic acid tincture and the like, the nail polish disclosed by the invention has low toxin and relatively small harm to human body; and the low-toxin low-harm nail polish has a certain nutritional function for nails as nutrients such as collagen and the keratin hydrolysate are added into the nail polish.

Description

technical field [0001] The invention relates to a nail polish, which belongs to the field of daily chemical industry. Background technique [0002] Nail polish is basically made of nitrocellulose with chemical solvents such as acetone, ethyl acetate, ethyl lactate, and tincture of phthalic acid. [0003] The nail polish is applied on the nails, which can make the nails red and moist, and does not fade for a long time, so it is loved by people. However, most of these raw materials have certain biological toxicity and should be avoided from entering the human body to cause chronic poisoning. After applying nail polish, do not hold the food with your hands, so as not to stick the nail polish to the food, and prevent "poison from entering the mouth". Special attention should be paid to oily finger foods such as fritters and cakes that contain a lot of oil, and you should not eat them with your hands, because the compounds contained in nail polish are fat-soluble compounds ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): A61K8/81A61Q3/02A61K8/34A61K8/65A61K8/73
Inventor 蔡少娟
Owner 汕头市乾力知识产权代理有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products