Light path interchange device based on total reflection

A technology of total reflection and optical path, applied in the field of nanometer measurement, to achieve the effect of no energy loss

Inactive Publication Date: 2012-06-27
UNIV OF SHANGHAI FOR SCI & TECH
View PDF8 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The optical path exchange device can simplify the optical path structure and reduce the number of optical elements in the optical path of the laser interferometer. However, the existing optical path exchange device is based on the principle of refraction, which will inevitably affect the optical characteristics of the light. Therefore, it is necessary to invent an optical path interchange device that does not affect the optical characteristics of the light, which can simplify the structure of the optical path of the laser interferometer without affecting the characteristics of the light

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Light path interchange device based on total reflection
  • Light path interchange device based on total reflection

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0014] see figure 1 , the invention discloses an optical path interchange device based on total reflection. As shown in the picture: it consists of 8 isosceles right-angle prisms with the same specifications. Wherein: each right-angled side of the first prism 1 and the second prism 2 extends on the same vertical straight line, and the hypotenuse of the first prism 1 and the second prism 2 is at an angle of 90 degrees; the other side of the first prism 1 The right angle side completely coincides with the right angle side of the third prism 3, and the hypotenuse of the third prism 3 is parallel to the hypotenuse of the first prism 1, and the right angle side of the fourth prism 4 coincides completely with another right angle side of the third prism 3 , and the hypotenuse of the fourth prism 4 and the hypotenuse of the third prism 3 form an angle of 90 degrees; the other right-angle side of the second prism 2 coincides completely with the right-angle side of the fifth prism 5, a...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a light path interchange device based on total reflection, which consists of eight isosceles right-angle prisms with the same specification; a light path structure control system between an incident light beam and an outgoing light beam is formed by the eight prisms; and two parallel incident light beams are totally reflected by the system for four times and are then emitted in parallel, so that position interchange can be realized, but the interval and the optical property of the two light beams are not changed. The light path interchange device is small in volume, simple in structure, stable in control and free from the influence for light beam polarization state.

Description

technical field [0001] The invention relates to an optical path structure for laser interferometry, and belongs to the field of nanometer measurement, in particular to an optical path interchange device based on total reflection. Background technique [0002] One of the most promising sciences of the 21st century. It involves scientific research and industrial fields such as microelectronics, optics, materials science, mechanics, biology and life sciences. Its purpose is to research, develop and process materials, devices and systems with critical dimensions close to or less than 100nm, so as to obtain A product with the required functionality and performance. [0003] At present, there are two main categories of nanometer measurement methods: non-optical measurement methods represented by scanning probe microscopes and optical measurement methods represented by various laser interferometers. Non-optical nanometer measurement methods represented by scanning probe microscop...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G01B9/02G02B17/04
Inventor 胡凯侯文玫乐燕芬时凯句爱松董洪波杨召雷
Owner UNIV OF SHANGHAI FOR SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products