Acidic etching solution, as well as preparation method and application thereof
An acidic etching solution and etching solution technology, applied in the field of etching solution and its preparation, can solve problems such as odor, difficulty in controlling etching speed, etc., and achieve the effects of reducing load, simplifying etching speed, and suppressing surface ripples
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[0042] Example 1
[0043] The etching solution of the present invention can be prepared by the reaction of hydrofluoric acid, nitric acid and silicide.
[0044] Hydrofluoric acid may be hydrogen fluoride gas, hydrogen fluoride acid, or the like. Nitric acid can be nitric acid aqueous solution, concentrated nitric acid, or fuming nitric acid. The concentrated nitric acid can be a 70% by weight aqueous nitric acid solution, and the fuming nitric acid can be a 98% by weight aqueous nitric acid solution. The smaller the content of any impurity in hydrofluoric acid and nitric acid, the better. The impurity content is usually below 10ppb, preferably below 5ppb.
[0045] When hydrogen fluoride gas or fuming nitric acid is used, there is little moisture from the raw materials, and high-concentration nitric acid and hydrofluoric acid etching solutions can be prepared. In particular, hydrogen fluoride is used as a combination of hydrofluoric acid and fuming nitric acid as nitric acid.
[004...
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[0049] Example 2
[0050] Using hydrofluoric acid, 70wt% nitric acid aqueous solution and silicon as raw materials, mixing at a ratio of 15wt% hydrofluoric acid, 40wt% nitric acid and 14.5wt% fluorosilicic acid to obtain an acid etching solution.
[0051] An etching tank made of polyethylene is used, and the mixed acid is circulated at room temperature. Gently put a piece of ground silicon wafer into the etching tank with a diameter of 125mm, usually after 3 minutes, lift up the silicon wafer, wash with water, and the etching is over.
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