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Method for manufacturing memory resistor through three-dimensional maskless slurry direct writing forming and memory resistor

A technology of memristor and slurry, which is applied in the direction of electrical components, etc., can solve the problems of memristor design cost impact, etc., and achieve the effect of good product parameter consistency, simple process, and reduced manufacturing cost

Inactive Publication Date: 2012-07-25
SHENZHEN GRADUATE SCHOOL TSINGHUA UNIV
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  • Abstract
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  • Application Information

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Problems solved by technology

However, the design and cost of memristors are currently the biggest obstacles affecting their practical applications.

Method used

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  • Method for manufacturing memory resistor through three-dimensional maskless slurry direct writing forming and memory resistor
  • Method for manufacturing memory resistor through three-dimensional maskless slurry direct writing forming and memory resistor

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Embodiment Construction

[0018] The preferred embodiments of the present invention will be described in further detail below in conjunction with the accompanying drawings.

[0019] The method of the present invention mainly includes the following steps:

[0020] 1. Research on slurry configuration and rheological properties.

[0021] The preparation of high-quality gel slurry is the basis of the whole slurry direct writing technology. To construct a gel slurry with a span of three-dimensional periodic structure needs to meet the following two conditions: First, the slurry must have good viscoelasticity, which means that the slurry can be extruded from the needle under shear stress Flow out, even if there is no support in the corresponding position of the lower layer, it can be cured immediately to maintain the predetermined grouting shape; secondly, the slurry must have a high solid volume content to minimize the shrinkage caused by drying, that is Said that the particle network must be able to resist shri...

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Abstract

The invention provides a method for manufacturing a memory resistor. The method comprises the following steps that: nanometer metal powder and nanometer doping semiconductor ceramic powder are respectively dispersed in organic media for preparing slurry; extrusion forming is carried out, a three-dimensional maskless slurry direct writing system is adopted, each slurry is supplied to corresponding needle heads for extrusion layer by layer along set tracks according to a designed multilayer lattice three-dimensional model, a multilayer lattice structure blank body using metal slurry as a framework is formed, and in the blank body, a doping semiconductor ceramic slurry layer is clamped between upper layer metal slurry and lower layer metal slurry at the lattice intersection part; and the drying sintering is carried out, and organic ingredients in the blank body is removed to obtain the memory resistor. The manufacture of the memory resistor is realized through the three-dimensional maskless slurry direct writing forming process, the process is simple, the program control is realized, different slurry can be prepared according to requirements, structure models can be designed according to requirements, and the memory resistor with complicated lattice structures can be manufactured in one step.

Description

Technical field [0001] The invention relates to a manufacturing method of a memristor, in particular to a method for manufacturing a memristor by three-dimensional moldless slurry direct writing molding and a memristor. Background technique [0002] Ceramic three-dimensional moldless slurry direct writing molding technology is a moldless direct writing molding method that does not rely on molds and does not require subsequent external processing to prepare micro-scale three-dimensional complex structure functional ceramic materials. This technology uses air pressure as the driving force to extrude the raw materials, and through the computer program to control the molding equipment to form layer by layer, the designed structure is obtained. It is a method that integrates computer-aided design, precision machinery and material science. The processing of polymers, functional ceramics and some soft materials (such as paraffin), especially in the preparation of functional ceramic devi...

Claims

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Application Information

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IPC IPC(8): H01L45/00
Inventor 李勃蔡坤鹏李亚运孙竞博李吉皎周济李龙土苏水源
Owner SHENZHEN GRADUATE SCHOOL TSINGHUA UNIV
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