Color filter substrate and manufacturing method for same

A color filter and manufacturing method technology, applied in the direction of optical filters, optics, optical components, etc., can solve the problems of no optical difference, low production efficiency and production capacity, and reduce equipment utilization rate, so as to improve the position Calculate the accuracy and equipment utilization rate, improve production efficiency and throughput, and enhance the effect of optical difference
CN102707486AActive Publication Date: 2012-10-03TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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Patent Information

Authority / Receiving Office
CN Β· China
Current Assignee / Owner
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
Publication Date
2012-10-03

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Abstract

The invention discloses a color filter substrate and a manufacturing method for the same. The method comprises the following steps of: forming a black matrix pattern in a pixel ineffective area of a transparent substrate to form a mark; coating a transparent conductive layer on the pixel inactive area to cover the mark; and patterning the transparent conductive layer to make the covering characteristics of the transparent conductive layer at the mark and the peripheral zone of the mark different. Optical differences of the mark and the peripheral zone of the mark under a charge coupled device (CCD) optical pickup lens are effectively enhanced, and the success rate of the pickup of the mark is increased, so that production efficiency is improved.
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Description

technical field

[0001] The invention relates to the technical field of liquid crystal display, in particular to a color filter substrate and a manufacturing method thereof. Background technique

[0002] In the liquid crystal panel manufacturing process, the alignment mark (mark) plays an important role. When position confirmation and coordinate calculation are required, the position of the alignment mark needs to be read. For example, when performing coordinate positioning of precision measuring instruments and exposure alignment of exposure machines, it is necessary to read the position of the alignment marks; Confirm the group position of the substrate.

[0003] see figure 1 , figure 1 It is a schematic diagram of setting the alignment mark on the existing color filter substrate.

[0004] Such as figure 1 As shown, in the prior art, the transparent substrate 10 of the color filter substrate includes a plurality of effective pixel regions 100 and invalid pixel regions ...

Claims

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