Pattern contraposition method based on double printing stations and device thereof

Abstract

The invention discloses a pattern contraposition method based on double printing stations and a device thereof. The pattern contraposition method comprises the following steps of: printing three reference points on a printing stock printed for the first time, and preparing three reference points on a silk screen in the overprinting process; in the follow-up overprinting process, collecting the coordinates of the reference points on the printing stock on a left part delivery station or a right part delivery station through a camera, and simultaneously collecting the coordinates of the reference points on the silk screen on a middle printing station; and comparing the deviation of the two coordinates by using a controller, and further controlling U, V and W motors to drive the silk screen to carry out movement adjustment. The pattern contraposition method has the advantages that the contraposition printing is carried out on the printing stock by adopting a pattern contraposition manner, the errors of the size and shape existing in the printing stock are overcome, the error accumulation is avoided, the contraposition accuracy of grid lines on the printing stock is effectively increased, and the high quality of silk screen printing is ensured. According to the pattern contraposition method, the charging is carried out at two sides, sheet delivery and printing are simultaneously finished, and the whole printing cycle period is substantially shortened, thereby increasing the productivity of equipment.

Description

technical field [0001] The invention relates to screen printing equipment, in particular to a method and device for aligning positions using graphics in a screen printing process based on double printing stations. Background technique [0002] In the traditional screen printing machine, the alignment is often performed on the side of the silicon wafer of the solar cell. Because there are deviations in the shape and size of each silicon wafer, repeated overprinting is easy to form deviation accumulation, resulting in the occurrence of screen printed silicon wafer grid lines. Offset or dislocation seriously affects the product quality of this process. Contents of the invention [0003] The present invention aims to solve the problem in the prior art that relying on the alignment of the edge of the solar cell silicon wafer, the error accumulation is likely to occur in the secondary printing or mask pattern, resulting in the shift or dislocation of the grid line pattern of the...

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Problems solved by technology

[0003] The present invention aims to solve the problem in the prior art that relying on the edge alignment of the silicon wafer of the solar cell, it is easy to generate deviation accumulation in the secondary printing or mask pattern, resulting in the shift or dislocation of the grid line pattern of the silicon wafer, and proposes to use the silicon wafer The method and device for aligning the preset graphics on the surface. The method and device are based on a patent "A high-efficiency screen printing mechanism (patent application number 201220286904.1)" previously applied by the company. On the basis of this patent Realize graphic alignment

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