Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Transfer box

A transmission box and storage box technology, which is applied in the field of transmission boxes, can solve the problems of cost loss, large volume, and falling

Inactive Publication Date: 2012-11-28
GUDENG PRECISION IND CO LTD
View PDF4 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Usually, the handling of photomask boxes is mainly carried by manpower. For example, multiple photomask boxes are placed on a cart, and the cart will transport the photomask boxes to the next stage of the preparation process. However, in the current preparation process, the photomask Its volume tends to become larger and larger, and its weight is relatively heavier. In the process of manual handling, it is inevitable that the risk of falling may occur, resulting in a serious loss in cost

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Transfer box
  • Transfer box
  • Transfer box

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0047] A front-opening delivery box provided by the present invention comprises: a left side, a right side, an upper side, a lower side, a rear side, and an opening; a door body, and the front-opening delivery box The size of the opening is consistent; an overhead lifting and handling system is arranged on the upper side of the front-opening delivery box; a pair of support frames are relatively arranged on the left and right sides of the front-opening delivery box; multiple pairs Slide rail grooves are formed on the pair of support frames in parallel and opposite, and extend from the opening to the rear side; a plurality of pairs of first rollers are arranged on each slide rail groove at one end of the opening; a plurality of placing plates, each placing plate It is arranged in parallel on each pair of slide rail grooves; wherein, the placing plate is characterized in that: the placing plate has an upper surface, and there are a plurality of ribs on the edge of the upper surfac...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a transfer box which can be used for transferring by using an automated material handling system (AMHS). An overhead host transfer system configured on the transfer box is used for transporting photo masks mechanically; the risk of photo mask damage caused by manual transfer is reduced greatly, and the labor waste is reduced, and furthermore the time required by a manufacturing process is reduced.

Description

technical field [0001] The present invention relates to a transport box, in particular to a transport box loaded with a plurality of photomask boxes by using the framework of an automatic transport and delivery system. Background technique [0002] The rapid development of modern semiconductor technology, in which optical lithography (Optical Lithography) plays an important role, as long as it is about the definition of graphics (pattern), all need to rely on optical lithography. In the application of optical lithography technology to semiconductors, the designed circuit is made into a light-transmitting photo mask with a specific shape. Using the principle of exposure, the light source is projected onto the silicon wafer through the mask to expose and display a specific pattern. Since any dust particles (such as particles, dust or organic matter) attached to the mask will cause the quality of projection imaging to deteriorate, the mask used to generate graphics must be kep...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): H01L21/673H01L21/677
Inventor 古震维吕保仪廖坤鸿盛剑平
Owner GUDENG PRECISION IND CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products