Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Deoxyribonucleic acid (DNA) sequencing device based on graphene nanopore-microcavity-solid-state nanopore and manufacturing method

A graphene nanopore and DNA sequencing technology, applied in measurement devices, nanotechnology, material analysis by electromagnetic means, etc., can solve problems such as being susceptible to external environment interference and low signal-to-noise ratio

Active Publication Date: 2014-06-11
TSINGHUA UNIV
View PDF2 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In order to solve the above-mentioned technical problems, the object of the present invention is to propose a DNA sequencing device and manufacturing method based on graphene nanopore-microcavity-solid-state nanopore, which can improve the low signal-to-noise ratio and easy-to-use of the traditional nanopore ion current blocking method. Problems such as interference from the external environment, thereby improving the sequencing accuracy

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Deoxyribonucleic acid (DNA) sequencing device based on graphene nanopore-microcavity-solid-state nanopore and manufacturing method
  • Deoxyribonucleic acid (DNA) sequencing device based on graphene nanopore-microcavity-solid-state nanopore and manufacturing method
  • Deoxyribonucleic acid (DNA) sequencing device based on graphene nanopore-microcavity-solid-state nanopore and manufacturing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0036] The present invention will be described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0037] like figure 1Shown, a kind of DNA sequencing device based on graphene nanopore-microcavity-solid-state nanopore of the present invention, comprises SOI silicon chip 1, places the silicon dioxide buried layer 2 in SOI silicon chip 1, is buried in silicon dioxide An inverted pyramid-shaped microcavity 21 is etched on the SOI silicon wafer 1 at the upper part of the layer 2, and a columnar hole with a diameter larger than the bottom diameter of the inverted pyramid-shaped microcavity 21 is etched on the SOI silicon wafer 1 at the lower part of the silicon dioxide buried layer 2. , the top of the inverted pyramid-shaped microcavity 21 is a solid nanopore 20, the silicon dioxide film 5 is coated on the outside of the SOI silicon wafer 1, and the silicon dioxide film 5 at the bottom of the columnar hole is coated with a metal platinum film 6...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
diameteraaaaaaaaaa
diameteraaaaaaaaaa
Login to View More

Abstract

The invention discloses a deoxyribonucleic acid (DNA) sequencing device based on a graphene nanopore-microcavity-solid-state nanopore and a manufacturing method. The manufacturing method comprises the steps of etching an inverted-pyramid-shaped microcavity in the upper part of a silicon on insulator (SOI) silicon wafer; etching a columnar hole on the lower part of the SOI silicon wafer, wherein the tower top of the inverted-pyramid-shaped microcavity is the solid-state nanopore; etching the graphene on the upper part of the inverted-pyramid-shaped microcavity; etching the graphene nanopore in the center of the graphene, wherein a platinum electrode and a longitudinal weak current measurement device as well as a power supply form a longitudinal weak current measurement loop, and a gold electrode and a transverse weak current measurement device as well as the power supply form a transverse weak current measurement loop; etching an inverted cone cavity in the front side of the SOI silicon wafer; etching a vertical columnar hole at the back of the SOI silicon wafer; corroding an oxidized buried layer on the SOI silicon wafer to form the solid-state nanopore; transferring the prepared graphene to the surface of the SOI silicon wafer; etching the graphene nanopore coaxial to the fixed nanopore in the center of the graphene; and enabling a chip, the power supply and an ampere meter to form a circuit so as to realize the sequencing of the DNA by testing the change of current intensity in the circuit when the DNA penetrates through the nanopore.

Description

technical field [0001] The invention relates to the technical field of biomolecular detection, in particular to a graphene nanopore-microcavity-solid-state nanopore-based DNA sequencing device and a manufacturing method. Background technique [0002] DNA sequencing technology is one of the core technologies of modern life science research. Among all the third-generation sequencing technologies targeting low-cost, high-throughput, and direct sequencing, nanopore-based single-molecule sequencing is considered to be the most promising technology for realizing the $1,000 human genetic testing project. [0003] The pore size of solid-state nanopores can be flexibly controlled artificially, and has ideal biochemical pore size stability and excellent physical and chemical properties. With the help of microscope electron beam technology, focused ion beam technology (FIB) and other technologies, researchers have successfully fabricated various nanometer and subnanometer solid-state ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G01N27/416B82Y35/00
Inventor 刘泽文邓涛陈剑
Owner TSINGHUA UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products