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Method for quickly forming patterning device through nano metallic material sedimentation
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Al technical title is built by PatSnap Al team. It summarizes the technical point description of the patent document.
A nano-metal and forming method technology, applied in the direction of copying/marking method, printing of special varieties of printed matter, printing, etc., can solve the problems of waste, combination, and high price, and achieve reduced material waste, simple preparation process, and uniform particle size Effect
Active Publication Date: 2015-02-25
SHANGHAI UNIV
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Problems solved by technology
However, the existing problem is that the raw materials are precious metals, which are expensive. Using these methods requires a large amount of raw materials, which is easy to cause waste; at the same time, these methods are not conducive to the combination with the design and preparation process of nanometer equipment.
However, there is no method for in-situ synthesis of nano-gold and silver technology through droplet jetting technology.
Method used
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Embodiment 1
[0021] see figure 1 A rapid prototyping method for preparing patterned devices by depositing nano-metal materials, taking the preparation of nano-gold thin film devices as an example, includes the following steps:
[0022] 1) Preparation of the precursor solution of gold element: Dissolve 1% chloroauric acid in deionized water, the volume ratio of chloroauric acid to deionized water is 1:79, prepare the gold compound solution, and form the precursor solution of gold element;
[0023] 2) Preparation of reducing agent solution: Mix 4% sodium citrate, 1% tannic acid and 50mM potassium carbonate as reducing agent, dissolve the reducing agent in deionized water, and the corresponding volume ratio is 1:0.1:0.05: 19.15, prepare reducing agent solution;
[0024] 3) Filtration of reactants: use a filter to filter the precursor solution of gold element prepared in the above step 1) to obtain filtrate a, and at the same time use a filter to filter the reducing agent solution prepared in...
Embodiment 2
[0029] This embodiment is basically the same as Embodiment 1, especially in that:
[0030] see figure 2 , in this embodiment, the rapid prototyping method for preparing patterned devices by depositing nano-metal materials can prepare nano-gold dot matrix devices. By controlling the droplet ejection system in the above step 4), ink a is first deposited on the printing substrate On the designated position of the material 4, a coating droplet matrix 7 is formed, and then ink b is printed on the coating droplet matrix 7, ink a and ink b undergo a chemical reaction, and gold nanoparticles are precipitated to form an in-situ synthesis The nano-gold lattice 6 is to form a nano-gold lattice device. Different droplet ejection patterns can also be prepared by changing the dot pitch printed by the printing nozzle 2 .
Embodiment 3
[0032] This embodiment is basically the same as the previous embodiment, and the special features are:
[0033] In this embodiment, in the above step 5), the printing substrate material is heated to 60° C., and the temperature of the printing substrate material is kept constant. The size and dispersion of the synthesized gold nanoparticles can be controlled by changing the temperature, and the temperature is preferably controlled at 60° C., which can react to obtain uniformly dispersed gold nanoparticles of 10 nm.
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Abstract
The invention discloses a method for quickly forming a patterning device through nano metallic material sedimentation. The method comprises the following steps that a target metallic compound is dissolved in deionized water so as to form a precursor solution; a reducing agent is also dissolved in the deionized water so as to form a reducing agent solution; a filter is used to respectively filter the precursor solution and the reducing agent solution, so that inks (a and b) are obtained; the inks (a and b) are respectively injected into different liquid reservoirs of a droplet jetting system; and a printing substrate material is heated and thermally insulated, the droplet jetting system is controlled, so that the ink (a) is settled on the designated position of the printing substrate material, the ink (b) is then printed on the ink marks of the ink (a) on a substrate, and the inks are chemically reacted with each other so as to separate the nanoparticles of the target metal material out, so that the patterning nano-metallic device is formed. By the method, the in-situ synthesizing and patterning of gold and silver nanoparticles are realized, and the periods for producing the gold and silver nanoparticles are shortened; and the method is compatible to a micro-electromechanical systems (MEMS) technology, is simple to produce and is low in cost.
Description
technical field [0001] The invention relates to a rapid prototyping method, in particular to a rapid prototyping method for patterned metal nanomaterial devices. Background technique [0002] With the continuous development of science and technology, gold and silver nanoparticles and the assembly system containing gold and silver nanoparticles are favored by people because of their special excellent properties and wide application prospects. Gold and silver nanoparticles have inherent properties such as volume effect, surface effect, quantum size effect, and macroscopic quantum tunneling effect. At the same time, colloidal gold and silver nanoparticles also have some unique properties, such as good biological activity and biocompatibility. Gold and silver nanoparticles can be used in biomarkers; both gold and silver are typical Raman effect enhancers, through the physical or chemical interaction between gold or silver nanoparticles and detection molecules, the Raman scatteri...
Claims
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