Method for aligning by combining lenses with multiple magnifications in direct-writing photoetching machine

Abstract

The invention discloses a method for aligning by combining lenses with multiple magnifications in a direct-writing photoetching machine, and the method comprises the following steps of: (1) additionally arranging at least one lens converter between the objective lens and optical path of the direct-writing photoetching machine; (2) sequentially installing 5-magnification, 10-magnification and 20-magnification lens on the lens converter; (3) finding an alignment mark through the 5-magnification lens, moving the alignment mark to a view field center, and then sequentially finding alignment marks through the 10-magnification and the 20-magnification lens and moving the alignment marks to the view field center; (4) finding the alignment mark through a 50-magnification lens, moving the alignment mark to the view field center, and then extracting the center coordinates of the alignment marks. The method disclosed by the invention has the advantages of enhancing the accuracy of the relation of interlaminar relative positions of an exposure pattern by enhancing the alignment accuracy, solving the problem of difficult finding of the alignment marks when using a low-magnification single objective lens and increasing the exposure production efficiency of photoetching machines.

Description

technical field [0001] The invention specifically relates to a method for aligning multiple magnification lenses in a direct-writing photolithography machine, which belongs to the field of photolithography machine alignment control. Background technique [0002] The alignment control system of the direct-write lithography machine reflects the illumination light source to the surface to be processed through the spatial light modulator (SLM), and then uses the image sensor (CCD) to collect the reflected light on the surface to be processed to obtain alignment. graphics information, and then calculate the coordinates of the graphics center through the acquired graphics information. Calculate the offset of the surface to be processed relative to the motion platform of the lithography machine according to the center coordinates of multiple alignment patterns on the surface to be processed, and compensate in the exposure system. [0003] The direct-write lithography machine is a ...

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to provide a method for aligning multiple magnification lenses in a direct-writing lithography machine to solve the problems of difficulty in finding alignment marks and low alignment accuracy in the prior art

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