Preparation method of polyaniline and II-VI family semiconductor compound photovoltaic conversion film
A II-VI, photoelectric conversion technology, applied in the direction of semiconductor devices, circuits, electrical components, etc., can solve the problems that cannot be directly used, difficult to process and shape, easy to agglomerate semiconductor nanoparticles, etc., to achieve inhibition of agglomeration and operability Strong, simple effect of vulcanization or selenization process
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Embodiment 1
[0022] Take 1g ZnAl-CO 3 Disperse LDH in 90mL of methanol, then add 6.64mmol of nitric acid, stir for 3-5h, and pass nitrogen protection during this process; after the reaction, filter, rinse with methanol, and dry to obtain ZnAl-NO 3 LDH;
[0023] (2) Weigh 0.5g ZnAl-NO 3 LDH was added to 500mL formamide solution, magnetically stirred for 72h, centrifuged, and the precipitate was discarded to obtain a clear and transparent colloidal solution A;
[0024] (3) First, pretreat the quartz wafer, silicon wafer and ITO conductive glass: soak the quartz wafer or silicon wafer in a mixture of methanol and 37wt% hydrochloric acid for 20 minutes, the volume ratio of methanol and hydrochloric acid is 1:1, and then soak it in concentrated sulfuric acid Soak in water for 20 minutes, and finally put it into a mixed solution of concentrated sulfuric acid and hydrogen peroxide with a volume ratio of 7:3 and boil for 30 minutes, rinse with deionized water for later use; put the ITO conductiv...
Embodiment 2
[0032] Example 3
Embodiment 3
[0034] Take 1gZnCdAl-CO 3 Disperse LDH in 90mL of methanol, then add 6.64mmol of nitric acid, stir for 3-5h, and pass nitrogen protection during this process; after the reaction, filter, rinse with methanol, and dry to obtain ZnCdAl-NO 3 LDH;
[0035] (2) ZnCdAl-NO 3 LDH stripping method is the same as embodiment 1;
[0036] (3) Same as embodiment 1;
[0037] (4) Same as embodiment 1.
[0038] Example 4
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