Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Device and method for inspecting unevenness of film thickness

A technology of inspection device and inspection method, which is applied to measurement devices, optical devices, instruments, etc., can solve the problems of uneven film thickness, uneven pigment dispersion, uneven color, etc.

Inactive Publication Date: 2013-03-13
TORAY ENG CO LTD
View PDF9 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Conventionally, it has been known that, in the manufacturing process of color filters used in flat panel displays, etc., due to uneven pigment dispersion, uneven film thickness caused by aggregation of components, and vibration during film formation, resulting in uneven color

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Device and method for inspecting unevenness of film thickness
  • Device and method for inspecting unevenness of film thickness
  • Device and method for inspecting unevenness of film thickness

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0116] Embodiments for carrying out the present invention will be described using the drawings.

[0117] Figure 1A It is a plan view showing an embodiment for realizing the present invention.

[0118] Figure 1B It is a side view showing an embodiment for realizing the present invention.

[0119] In each figure, let the three axes of the orthogonal coordinate system be X, Y, and Z, let the XY plane be the horizontal plane, and let the Z direction be the vertical direction. In particular, in the Z direction, the direction of the arrow is represented as upward, and the opposite direction is represented as downward. Furthermore, let the rotation direction around the X direction be the θ direction.

[0120] The film thickness unevenness inspection device 1 includes a substrate moving unit 2 , a light source unit 3 , an imaging unit 4 , an inspection unit, and a control unit 9 . Here, the substrate to be inspected is described as an example of a substrate 10 coated with a colo...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The present invention provides a film thickness unevenness inspection device and method capable of acquiring an image with brightness and contrast suitable for inspection, so as to obtain an accurate inspection result. The present invention discloses a film thickness unevenness inspection device and method, characterized in moving a substrate with a surface formed thereon a coating film along a direction and, at the same time, inspecting film thickness unevenness of the coating film formed on the substrate. A film thickness inspection portion is provided for inspecting a thickness of the coating film. A light source portion comprises a reflection illumination portion installed in one side of an image capturing portion, and a transmission illumination portion installed in a location opposite to the image capturing portion with the substrate installed in-between. The image capturing portion comprises an image capturing portion angle adjustment mechanism for adjusting a relative angle with respect to the substrate. The reflection illumination portion comprises a reflection illumination angle adjustment mechanism for adjusting a relative angle between the reflection illumination portion and the substrate. The transmission illumination portion comprises a transmission illumination angle adjustment mechanism for adjusting a relative angle between the transmission illumination portion and the substrate. The film thickness unevenness inspection device comprises a control portion. According to film thickness information from the film thickness inspection portion, the control portion controls the reflection illumination angle adjustment mechanism and the transmission illumination angle adjustment mechanism to regulate a light quantity of reflection illumination and a light quantity of transmission illumination.

Description

technical field [0001] The present invention relates to a method for inspecting uneven thickness (so-called film thickness unevenness) of a color film formed on a substrate such as glass or a translucent resin material in a manufacturing process of a color filter, etc. Devices and methods. Background technique [0002] Conventionally, it has been known that, in the manufacturing process of color filters used in flat panel displays, etc., due to uneven pigment dispersion, uneven film thickness caused by aggregation of components, and vibration during film formation, resulting in Uneven color. In order to prevent the trouble of continuing the manufacturing operation in the state where the film thickness unevenness occurs, the presence and degree of color unevenness are inspected using a camera and transmitted illumination (for example, Patent Document 1). [0003] Furthermore, there is described a technology that can clearly image the generated unevenness corresponding to va...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G01B11/06
CPCG01B11/0625G01N21/8422H01L21/67253
Inventor 和田浩光田嶋久容小山恭史滨川直良水原正志
Owner TORAY ENG CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com