Method for automated determination of an optimally parameterized scatterometry model

Abstract

Provided is an automated determination of an optimized parameterization of a scatterometry model for analysis of a sample diffracting structure having unknown parameters. A preprocessor determines from a plurality of floating model parameters, a reduced set of model parameters which can be reasonably floated in the scatterometry model based on a relative precision for each parameter determined from the Jacobian of measured spectral information with respect to each parameter. The relative precision for each parameter is determined in a manner which accounts for correlation between the parameters for a combination.

Description

[0001] Cross References to Related Applications [0002] This application claims the benefit of U.S. Patent Application No. 12 / 841,932 (Attorney Docket No. 8536P005), entitled "Method for Automatically Determining Optimal Parameterized Scatterometric Models," filed July 22, 2010, The entire content of this application is hereby incorporated by reference for all purposes. technical field [0003] Embodiments of the present invention relate to scattering, in particular to methods and systems for automatically selecting a set of floating parameters. Background technique [0004] Optical measuring technology generally refers to the possibility, like scatterometry, of providing features with workpiece parameters during the manufacturing process. In practice, light is irradiated directly on a periodic grating formed on a workpiece and the spectrum of the reflected light is measured and analyzed to characterize the grating parameters. Characterization parameters can include criti...

AI Technical Summary

Problems solved by technology

Taking further into account the diversity of measurement acquisition points typical in semiconductor processing and the frequency of process changes that

Images