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Method of manufacturing directional coupler of photonic crystal

A technology of directional couplers and photonic crystals, applied in light guides, optics, instruments, etc., can solve the problems of long coupling period, low integration, and large volume, and achieve the effect of small volume, high integration, and reduced device volume

Active Publication Date: 2013-04-10
UNITED MICROELECTRONICS CENT CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the traditional photonic crystal directional coupler has a large volume and low integration due to its long coupling period.

Method used

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  • Method of manufacturing directional coupler of photonic crystal
  • Method of manufacturing directional coupler of photonic crystal
  • Method of manufacturing directional coupler of photonic crystal

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Embodiment Construction

[0050] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0051] Such as figure 1 , 2 , 3 is a schematic structural diagram of a photonic crystal directional coupler provided by a preferred embodiment of the present invention. The photonic crystal directional coupler includes a substrate and a number of dielectric columns vertically arranged on the substrate. The plurality of dielectric columns surround two independent main waveguide defects 9 and coupling waveguide defects 10, and the main waveguide defect 9 and coupling waveguide There is a row of dielectric pillars between the line defects 10 , and the row of dielectric pillars are racetrack-shaped d...

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Abstract

The invention discloses a method of manufacturing a directional coupler of a photonic crystal. The directional coupler of the photonic crystal comprises a substrate and a plurality of dielectric cylinders arranged on the substrate. A dominant transmission line defect and a coupling transmission line defect which are mutual independent are formed among the plurality of dielectric cylinders, at least one row of dielectric cylinders are arranged between the dominant transmission line defect and the coupling transmission line defect, the row of dielectric cylinders between the dominant transmission line defect and the coupling transmission line defect is in track type, and the rest dielectric cylinders are cylindrical. The manufacturing method includes steps of preparing scribing slot needed in scribing, preparing photoresist mask needed in inductively coupled plasma (ICP) etching on the scribing slot and obtaining a silicon cylinder array structure, ICP etching with the photoresist mask structure prepared in step two and preparing the main structure of the directional coupler of the photonic crystal, finishing the track-type media cylinders in the main structure, and removing marginal area of the main structure and forming the directional coupler of the photonic crystal. The method of manufacturing the directional coupler of the photonic crystal has the advantages of small size, compact structure, high efficiency and high integration level.

Description

technical field [0001] The invention relates to a manufacturing method of a coupler, in particular to a manufacturing method of a photonic crystal directional coupler. Background technique [0002] Photonic crystals, also known as optical semiconductors, are artificial microstructures formed by substances with different dielectric constants arranged periodically in space. Photonic crystals have a photonic band gap and have the characteristics of controlling the propagation of light in them. They are potential application materials for realizing large-scale optoelectronic integration and all-optical networks in the future. When defects are introduced in intact photonic crystal materials, defect states are introduced in the photonic forbidden band. For example, the introduction of point defects can localize the light in the defects to form a photonic crystal resonator; and if the introduction of line defects, the light can be confined to propagate in the line defects to form ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B6/13G02B6/136
Inventor 崔乃迪郭进冯俊波滕婕谢峰王俊赵恒
Owner UNITED MICROELECTRONICS CENT CO LTD
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