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Method for dissolving high purity zirconia

A zirconia, high-purity technology, which is applied in the field of high-purity zirconia dissolution, can solve the problems of poor accuracy and precision of measurement results, less sample melting amount, and great harm to human body and environment, so as to reduce the influence of interference signals , lower the detection limit of the analysis and improve the sensitivity of the analysis

Active Publication Date: 2013-05-08
CDGM OPTICAL GLASS
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] However, it takes a long time to melt high-purity zirconia by the above method, generally about 10 hours, the amount of sample melting is small, and many reagents are added, which is easy to substitute impurities. It is easy to cause serious distortion of the analysis data of trace impurity elements in high-purity zirconia, and the accuracy and precision of the measurement results are poor, which cannot meet the analysis requirements of trace impurity elements in high-purity zirconia. Therefore, the above melting method is not suitable for high-purity zirconia. Determination of impurity elements and purity of pure zirconia

Method used

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  • Method for dissolving high purity zirconia

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Embodiment

[0024] 1) Grind high-purity (purity > 99.95%) zirconia with an agate mortar to a particle size ≥ 320 mesh, place it in a porcelain crucible, put it in a resistance furnace and burn it at 900°C for 1 hour, then cool to room temperature;

[0025] 2) Place the beaker numbered 1# on the balance and weigh 3g of analytically pure ammonium sulfate with a particle size of ≥100 mesh and a purity of 99wt%, and place it evenly on the bottom of the beaker; then weigh the high-purity ammonium sulfate obtained in step 1). Zirconium 1g, place it evenly on the surface of analytically pure ammonium sulfate; place the beaker numbered 2# on the balance and weigh 3g of analytically pure ammonium sulfate with a particle size ≥ 100 mesh and a purity of 99wt%, and place it evenly in the beaker Bottom; then weigh the high-purity zirconia 1g that step 1) obtains, and place it evenly on the surface of analytically pure ammonium sulfate; place the beaker that is numbered 3# on the balance and weigh the p...

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Abstract

The invention provides a method for dissolving high purity zirconia, which is applied to the test of impurity elements and purity of the high purity zirconia. The method for dissolving the high purity zirconia comprises the following steps of: (1) grinding the high purity zirconia, later firing, and then cooling; (2) weighting the pure analysis ammonium sulphate, later weighting the high purity zirconia obtained in the step (1), and then putting the high purity zirconia on the pure analysis ammonium sulphate; (3) adding high-grade purity concentrated sulfuric acid, and then heating so that the high purity zirconia can be completely dissolved; and (4) continuously heating so that the liquor is evaporated till salt-out appears, and then cooling to finish the treatment. If adopting the method disclosed by the invention to dissolve the high purity zirconia, the required solvent volume is little, a few impurities are substituted, much high purity zirconia is dissolved, and required time for completely dissolving the simples is short, which is about 30-60 minutes. The method disclosed by the invention reduces the interference caused by introducing the solvent to the greatest extent, reduces the influence of the interference signal, reduces the lower analysis and detection limitation of elements to be tested, and improves the analysis sensitivity, accuracy and precision.

Description

technical field [0001] The invention relates to a method for dissolving zirconia, in particular to a method for dissolving high-purity zirconia. Background technique [0002] Most of the impurity elements in high-purity (purity>99.95%) zirconia are trace or trace amounts. When traditional wet chemical analysis and testing methods and DC arc emission spectrometry are used to detect trace and trace impurity elements, the sensitivity and accuracy of analysis and testing are relatively low. The relative error of the test data is relatively large, which can no longer meet the requirements. It must be analyzed with the help of more advanced and scientific instruments, such as the use of inductively coupled plasma optical emission spectrometer (ICP-OES), inductively coupled plasma mass spectrometer (ICP-MS ) and other determinations. Using the above instruments for analysis, it is necessary to process the solid sample so that it is in the form of a solution before analysis and ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N1/44
Inventor 巫兰萍周佺佺
Owner CDGM OPTICAL GLASS
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