Manufacturing method of five-junction-cascaded photovoltaic battery with antireflection film
A manufacturing method and technology of photovoltaic cells, applied in the direction of final product manufacturing, sustainable manufacturing/processing, circuits, etc., can solve the problems of photovoltaic cell current density reduction, decrease, increase transmission, etc.
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Embodiment 1
[0026] The manufacturing method that the present invention proposes comprises the following steps successively:
[0027] Step 1: sequentially growing GaAs sub-cells (2) and GaInAs sub-cells (3) on the InP substrate (1) using the MOVCD process;
[0028] Step 2: using a vacuum coating machine to vapor-deposit the first anti-reflection layer (4) on the GaInAs sub-cell (3);
[0029] Step 3: sequentially growing GaInP sub-cells (5) and strain-compensated GaAsP / GaInAs superlattice cells (6) on the first anti-reflection layer (4) by MOCVD process;
[0030] Step 4: growing a second anti-reflection layer (7) on the strain-compensated GaAsP / GaInAs superlattice cell (6) by MOCVD process;
[0031] Step 5: using a vacuum coating machine to vapor-deposit the third anti-reflection layer (8) on the second anti-reflection layer (7);
[0032] Step 6: using MOCVD process to grow GaInP sub-cells (9) on the third anti-reflection layer (8);
[0033] Step 7: growing the fourth anti-reflection lay...
Embodiment 2
[0044] Introduce below the preferred embodiment of the manufacturing method that the present invention proposes, and this manufacturing method comprises the following steps successively:
[0045] Step 1: sequentially growing GaAs sub-cells (2) and GaInAs sub-cells (3) on the InP substrate (1) using the MOVCD process;
[0046] Step 2: using a vacuum coating machine to vapor-deposit the first anti-reflection layer (4) on the GaInAs sub-cell (3);
[0047]Step 3: sequentially growing GaInP sub-cells (5) and strain-compensated GaAsP / GaInAs superlattice cells (6) on the first anti-reflection layer (4) by MOCVD process;
[0048] Step 4: growing a second anti-reflection layer (7) on the strain-compensated GaAsP / GaInAs superlattice cell (6) by MOCVD process;
[0049] Step 5: using a vacuum coating machine to vapor-deposit the third anti-reflection layer (8) on the second anti-reflection layer (7);
[0050] Step 6: using MOCVD process to grow GaInP sub-cells (9) on the third anti-refl...
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