Process for manufacturing glass hard disc substrates
A manufacturing method and substrate technology, which are applied in the manufacture of base layers, record carriers, polishing compositions containing abrasives, etc., can solve the problems of deterioration of surface roughness, large leaching effect, etc., so as to improve cleanability and suppress surface roughness. degree of deterioration
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[0055] [Preparation Method of Polishing Liquid Composition]
[0056] The polishing liquid composition can be prepared by mixing components by a known method. From the viewpoint of economical efficiency, the polishing liquid composition is usually prepared as a concentrated liquid, and it is often diluted at the time of use. The polishing liquid composition can be used as it is, and if it is a concentrate, it can be used after being diluted. In the case of diluting the concentrated liquid, the dilution ratio is not particularly limited, and can be appropriately determined according to the concentration of each component in the concentrated liquid (content of grinding material, etc.), grinding conditions, and the like.
[0057] The pH of the polishing liquid composition may be adjusted to a predetermined pH after mixing the aforementioned components, or may be adjusted separately before mixing. Adjustment of pH can be performed with the said polyamine compound, the said acid, ...
Embodiment 1~18 and comparative example 1~16
[0092] 1. Preparation of ground glass substrate
[0093] An aluminosilicate glass substrate rough-polished in advance with a polishing liquid composition containing ceria abrasive grains was prepared as a glass substrate to be polished. The constituent elements contained in the substrate were as follows: the content of Si was 27% by weight, the content of Al was 9% by weight, and the content of Na was 6% by weight. The constituent elements were measured using the ESCA method under the following measurement conditions.
[0094] 〔ESCA measurement conditions〕
[0095] ·Sample making
[0096] The aluminosilicate glass substrate was cut into 1 cm×1 cm, placed on carbon double-sided tape, and fixed. In order to remove dust and the like on the surface, Ar sputtering was applied at an accelerating voltage of 2 kV for 6 minutes, and ESCA measurement was implemented.
[0097] ·Determination
[0098] Machine: PHI Quantera SXM made by Ulvac-phi
[0099] X-ray source: monochromatic A...
Embodiment 1~9、14~18
[0110] Embodiment 1~9,14~18: citric acid
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