Unlock instant, AI-driven research and patent intelligence for your innovation.

Process for manufacturing glass hard disc substrates

A manufacturing method and substrate technology, which are applied in the manufacture of base layers, record carriers, polishing compositions containing abrasives, etc., can solve the problems of deterioration of surface roughness, large leaching effect, etc., so as to improve cleanability and suppress surface roughness. degree of deterioration

Active Publication Date: 2013-06-26
KAO CORP
View PDF7 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the method of polishing the glass substrate with an acidic polishing liquid composition has a large leaching effect due to a low pH, so a brittle leaching layer is also produced in the depth, and there is a risk of damage due to alkali etching in the alkali cleaning step after the polishing step. Surface roughness significantly exacerbates such problems

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Process for manufacturing glass hard disc substrates
  • Process for manufacturing glass hard disc substrates
  • Process for manufacturing glass hard disc substrates

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0055] [Preparation Method of Polishing Liquid Composition]

[0056] The polishing liquid composition can be prepared by mixing components by a known method. From the viewpoint of economical efficiency, the polishing liquid composition is usually prepared as a concentrated liquid, and it is often diluted at the time of use. The polishing liquid composition can be used as it is, and if it is a concentrate, it can be used after being diluted. In the case of diluting the concentrated liquid, the dilution ratio is not particularly limited, and can be appropriately determined according to the concentration of each component in the concentrated liquid (content of grinding material, etc.), grinding conditions, and the like.

[0057] The pH of the polishing liquid composition may be adjusted to a predetermined pH after mixing the aforementioned components, or may be adjusted separately before mixing. Adjustment of pH can be performed with the said polyamine compound, the said acid, ...

Embodiment 1~18 and comparative example 1~16

[0092] 1. Preparation of ground glass substrate

[0093] An aluminosilicate glass substrate rough-polished in advance with a polishing liquid composition containing ceria abrasive grains was prepared as a glass substrate to be polished. The constituent elements contained in the substrate were as follows: the content of Si was 27% by weight, the content of Al was 9% by weight, and the content of Na was 6% by weight. The constituent elements were measured using the ESCA method under the following measurement conditions.

[0094] 〔ESCA measurement conditions〕

[0095] ·Sample making

[0096] The aluminosilicate glass substrate was cut into 1 cm×1 cm, placed on carbon double-sided tape, and fixed. In order to remove dust and the like on the surface, Ar sputtering was applied at an accelerating voltage of 2 kV for 6 minutes, and ESCA measurement was implemented.

[0097] ·Determination

[0098] Machine: PHI Quantera SXM made by Ulvac-phi

[0099] X-ray source: monochromatic A...

Embodiment 1~9、14~18

[0110] Embodiment 1~9,14~18: citric acid

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
surface roughnessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

A process for manufacturing glass hard disc substrates, which includes a polishing step of polishing a glass substrate with an acidic polishing fluid and a subsequent alkali cleaning step of subjecting the resulting glass substrate to alkali cleaning, and which can inhibit the surface roughness degradation of the glass substrate in the alkali cleaning step and can attain improved cleanliness, while keeping a high polish rate in the polishing step. This process comprises: a step (1) of subjecting a glass substrate to be polished to polishing with a polishing fluid composition which contains a polyamine compound having 2 to 10 nitrogen atoms in the molecule and which has a pH of 1.0 to 4.2; and a step (2) of subjecting the substrate polished in the step (1) to cleaning with a cleaner composition which has a pH of 8.0 to 13.0.

Description

technical field [0001] The invention relates to a manufacturing method of a glass hard disk substrate. Background technique [0002] A hard disk mounted in a hard disk drive rotates at a high speed and thus consumes a lot of power. In recent years, lower power consumption has been demanded from the viewpoint of the environment. In order to reduce power consumption, there are methods of increasing the recording capacity per hard disk, reducing the number of hard disks mounted in the drive, and reducing the weight. In order to reduce the weight of one substrate, it is necessary to reduce the thickness of the substrate. From this point of view, the demand for glass substrates with higher mechanical strength than aluminum substrates has increased, and the expansion has been remarkable in recent years. In addition, in order to increase the recording capacity per substrate, it is necessary to reduce the unit recording area. However, if the unit recording area is reduced, a probl...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G11B5/84C03C19/00C03C23/00
CPCC03C19/00C03C23/0075C09G1/02G11B5/8404C03C15/02
Inventor 土居阳彦青野信幸
Owner KAO CORP