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Two-dimension decoupling motion platform

A motion platform and mobile platform technology, applied in the platform field, can solve the problem of not being able to achieve high rigidity and high precision at the same time, and achieve the effects of simple structure, high motion accuracy and high motion accuracy.

Active Publication Date: 2015-03-18
GUANGDONG HUST IND TECH RES INST
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] In view of the above problems, the purpose of the present invention is to provide a two-dimensional decoupling motion platform, which solves the problem that the prior art cannot achieve high stiffness and high precision at the same time

Method used

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Embodiment Construction

[0027] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

[0028] according to Figure 1 to Figure 4 The preferred embodiment shown is a two-dimensional decoupling motion platform, which includes a fixed platform base 100 and a mobile platform 200 arranged on the fixed platform base 100. The mobile platform 200 includes a horizontal mobile platform 210 and a vertical mobile platform 220. The fixed platform The seat 100 and the mobile platform 200 are on the same plane. In this embodiment, the fixed platform seat 100 and t...

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Abstract

The invention provides a two-dimension decoupling motion platform, which comprises a fixing platform seat and a moving platform arranged on the fixing platform seat, wherein the moving platform comprises a horizontal moving platform and a vertical moving platform; the horizontal moving platform comprises four horizontal flexible poles, a horizontal elastic element and a horizontal piezoceramic actuator; the horizontal flexible poles are arranged around the horizontal moving platform; the horizontal elastic element is arranged on one side of the horizontal moving platform; the horizontal piezoceramic actuator and the horizontal elastic element are arranged symmetrically; the vertical moving platform comprises four vertical flexible poles, a vertical elastic element and a vertical piezoceramic actuator; the vertical flexible poles are arranged around the vertical moving platform; the vertical elastic element is arranged on one side of the vertical moving platform; and the vertical piezoceramic actuator and the vertical elastic element are arranged symmetrically. The two-dimension decoupling motion platform is driven directly by the piezoceramic actuators to acquire nanoscale displacement output; rigidity of the motion platform is improved by the flexible elements; and motion is transmitted by the elastic mechanism, so that reliable high-rigidity two-dimension decoupling positioning motion is realized.

Description

technical field [0001] The invention relates to a platform, in particular to a two-dimensional decoupling motion platform. Background technique [0002] The precise positioning, high speed and high acceleration of the motion platform are the common requirements of many electronic manufacturing equipment and other precision machine tools. The performance of the motion platform determines the quality, efficiency and production capacity of the product. The traditional motion platform uses mechanical motion pairs such as screws to transmit motion. During the motion transmission process, due to the inherent friction and clearance of the motion pairs, the accuracy can only reach the micron level. However, with the development of science and technology, especially the development of microelectronic product technology, the volume of products reaches submicron or even nanometer level, so the positioning requirements of nanometer level are put forward for the motion platform, so it is...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B23Q1/34
Inventor 李泽湘隆志力念龙生张璐凡方记文
Owner GUANGDONG HUST IND TECH RES INST
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