Developing method

Abstract

The invention provides a developing method which comprises the following steps of: inclining a substrate relative to a developing machine table, wherein a first side edge of the substrate is upward, and a second side edge, which is opposite to the first side edge, of the substrate is downward; and an inclination angle between the substrate and the developing machine table is theta1 which is more than 0 degree and less than 90 degrees; uniformly spraying a developing solution to the substrate through a nozzle arranged above the substrate, wherein the developing time is t1; then inclining the substrate relative to the developing machine table, wherein the second side edge of the substrate is upward, and the first side edge of the substrate is downward; and an inclination angle between the substrate and the developing machine table is theta2 which is more than 0 degree and less than 90 degrees; uniformly spraying a developing solution to the substrate through the nozzle arranged above the substrate, wherein the developing time is t2. By the developing method, the uniformity of a linear width of a photoetched graph obtained by development can be improved.

Description

technical field [0001] The invention relates to the technical field of development, in particular to a development method, which can improve the line width uniformity of photolithography patterns. Background technique [0002] In the production process of TFT-LCD (Thin Film Field Effect Transistor Liquid Crystal Display), the photoresist coated on the glass substrate needs to be developed after exposure to obtain the required photolithography pattern. [0003] Such as figure 1 As shown, in the prior art, a development method applied to a high-generation production line, the glass substrate 2 moves along the horizontally placed developing machine 1 at an inclination angle θ, and the inclination angle θ between the glass substrate 2 and the developing machine 1 remains Invariably, a plurality of nozzles 3 arranged in a straight line are fixed on a flat nozzle frame 4 , the nozzle frame 4 is arranged above the glass substrate 2 , and the nozzle frame 4 is parallel to the glass...

AI Technical Summary

Problems solved by technology

The size of the glass substrate in the high-generation production line is particularly large, and the rotation of the developing machine 1 can easily cause the glass substrate to break, so this developing method is not suitable for the high-generation production line

Images