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A color filter substrate, preparation method and display device

A color film substrate and substrate technology, which is applied in optics, instruments, nonlinear optics, etc., can solve problems such as difficulty in ensuring uniformity and restrictions on the application of color film substrates, and achieve the effect of reducing production costs

Active Publication Date: 2015-07-29
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, according to the current level of photolithography technology and the properties of photoresist, only when the cross-sectional size of the top of the formed spacer is small, its height changes with the size of the exposure area of ​​the mask, such as sub-spacer The height difference design of the main spacer 61 and the auxiliary spacer 62 can only be realized when the cross-sectional size of the top of the object 62 is small (9-11 μm), and its uniformity is difficult to guarantee, and the maximum height difference that can be achieved is less than or equal to 0.5 μm, which brings great limitations to the application of color filter substrates

Method used

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  • A color filter substrate, preparation method and display device
  • A color filter substrate, preparation method and display device
  • A color filter substrate, preparation method and display device

Examples

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Embodiment 1

[0039] Such as image 3 , 4 As shown, a color filter substrate includes a substrate 1, a black matrix 3, a color filter layer 4, and a spacer 6. The black matrix 3 divides the substrate 1 into a plurality of sub-pixel regions distributed in a matrix, so The color filter layer 4 includes N kinds of color photoresist patterns of different colors, N≥3, and the color photoresist patterns of different colors are circularly arranged in discontinuous sub-pixel regions in adjacent N rows / columns, the The spacers 6 include main spacers 61 and sub-spacers 62, wherein the color photoresist patterns in M ​​adjacent sub-pixel regions of a single color in at least one row / column of the color filter layer 4 are also At the same time extending to the top of the black matrix 3 between the corresponding adjacent sub-pixel regions to form a continuous strip color photoresist pattern, and the continuous strip color photoresist pattern corresponds to the top of the black matrix 3. The sub-spacer...

Embodiment 2

[0067] The difference between this embodiment and Embodiment 1 lies in that the colors of the color photoresist patterns included in the color filter layer in the color filter substrate of this embodiment are different.

[0068] In this embodiment, the N=4, the color photoresist patterns of different colors include red photoresist patterns, green photoresist patterns, blue photoresist patterns and yellow photoresist patterns, the red photoresist patterns, the The green photoresist pattern, the blue photoresist pattern and the yellow photoresist pattern are arranged cyclically in rows / columns.

[0069] Such as Figure 7 , 8 As shown, in this embodiment, the three columns of color photoresist patterns of a single color, the green photoresist pattern, the blue photoresist pattern and the yellow photoresist pattern, are arranged in a continuous strip shape. A sub-spacer 62 that acts as a secondary support is provided above the black matrix corresponding to the yellow photoresist...

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Abstract

Provided are a color filter substrate, a manufacturing method, and a display apparatus. The color filter substrate comprises: a substrate (1), black matrixes (3), a color filter layer (4), and spacers (6). The black matrix (3) divides the substrate (1) into multiple sub pixel regions distributed in a matrix mode. The color filter layer (4) comprises N color photoresist patterns with different colors, N being greater than or equal to 3, the color photoresist patterns with different colors are circularly disposed in discontinuous sub pixel regions in neighboring N rows / columns, and at least one row / column of the single-color color photoresist patterns in the M neighboring sub pixel regions in the color filter layer (4) extends above the black matrix (3) between corresponding neighboring sub pixel regions to form a continuous strip-type color photoresist pattern, M being greater than or equal to 2. The spacers (6) comprise a main spacer (61) and an auxiliary spacer (62). The main spacer (61) is disposed above a position between the neighboring discontinuous color photoresist patterns, which is corresponding to the black matrix (3). The auxiliary spacer (62) is disposed above a portion of the continuous strip-type color photoresist pattern, which is corresponding to the black matrix (3).

Description

technical field [0001] The invention belongs to the field of display technology, and relates to a color filter substrate, a preparation method and a display device. Background technique [0002] A liquid crystal display (LCD: Liquid Crystal Display) has become a mainstream product in flat panel displays due to its small size, low power consumption, and no radiation. With the development of display technology, display devices with high transmittance, large size, low power consumption and low cost will become the future development direction. [0003] The existing liquid crystal panel includes a color filter (Color Filter) substrate and an array (Array) substrate, and a liquid crystal is arranged between the two substrates. In order to maintain the cell gap and prevent the liquid crystal from being squeezed and deformed, a spacer is usually provided between the color filter substrate and the array substrate. Such as figure 1 , 2 As shown, the color filter substrate in the ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02F1/1335G02F1/1333
CPCG02F1/133514G02F1/13394G02F2001/13396G02F1/133512G02B5/201G02F1/13396
Inventor 黎敏姜晶晶杨同华黄常刚
Owner BOE TECH GRP CO LTD
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