Europium doped aluminosilicate luminescent material, luminescent film and film electroluminescent display device as well as preparation methods thereof
A technology of aluminosilicate and luminescent materials, applied in luminescent materials, chemical instruments and methods, electrical components, etc.
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Embodiment 1
[0036] A method for preparing a thin film electroluminescent display device, comprising the following steps:
[0037] (1) Preparation of luminescent material: SrO and Al with a purity of 99.99% were weighed 2 o 3 , SiO 2 and Eu 2 o 3 Powder, the molar ratio is 1:0.99:2:0.01 (that is, 1:1-x / 2:2:x / 2, x value is 0.02), after uniform mixing, it is sintered at 1250°C to make Φ50×2mm luminescent materials;
[0038] (2) Prepare the substrate: take the glass substrate with ITO, and use acetone, absolute ethanol and deionized water to carry out ultrasonic cleaning on the glass substrate with ITO in sequence, then perform oxygen plasma treatment, and dry to obtain a clean Substrate;
[0039] (3) Coating: According to the pulse laser deposition method, install the luminescent material and the clean substrate in the vacuum chamber of the pulse laser system, the distance between the luminescent material and the substrate is 60mm, and then use a mechanical pump and a molecular pump to...
Embodiment 2
[0045] A method for preparing a thin film electroluminescent display device, comprising the following steps:
[0046] (1) Preparation of luminescent material: take MgO with a purity of 99.99%, Al 2 o 3 , SiO 2 and Eu 2 o 3 Powder, the molar ratio is 1:0.99:2:0.01 (that is, 1:1-x / 2:2:x / 2, x value is 0.02), after uniform mixing, it is sintered at 1250°C to make Φ50×2mm luminescent materials;
[0047] (2) Prepare the substrate: take the glass substrate with ITO, and use acetone, absolute ethanol and deionized water to carry out ultrasonic cleaning on the glass substrate with ITO in sequence, then perform oxygen plasma treatment, and dry to obtain a clean Substrate;
[0048] (3) Coating: According to the pulse laser deposition method, install the luminescent material and the clean substrate in the vacuum chamber of the pulse laser system, the distance between the luminescent material and the substrate is 60mm, and then use a mechanical pump and a molecular pump to vacuum Th...
Embodiment 3
[0053] A method for preparing a thin film electroluminescent display device, comprising the following steps:
[0054] (1) Preparation of luminescent material: take MgO with a purity of 99.99%, Al 2 o 3 , SiO 2 and Eu 2 o 3 Powder, the molar ratio is 1:0.975:2:0.025 (i.e. 1:1-x / 2:2:x / 2, x value is 0.05), after uniform mixing, it is sintered at 900°C to make Φ50×2mm luminescent materials;
[0055] (2) Prepare the substrate: take the glass substrate with ITO, and use acetone, absolute ethanol and deionized water to carry out ultrasonic cleaning on the glass substrate with ITO in sequence, then perform oxygen plasma treatment, and dry to obtain a clean Substrate;
[0056] (3) Coating: According to the pulse laser deposition method, install the luminescent material and the clean substrate in the vacuum chamber of the pulse laser system, the distance between the luminescent material and the substrate is 45mm, and then use a mechanical pump and a molecular pump to vacuum The c...
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