Samarium-doped strontium sulfate luminescent film, preparation method and organic electroluminescent device
A technology of luminescent film and strontium sulfate, which is applied in the direction of electroluminescence light source, luminescent material, electrical components, etc.
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[0019] Step S1, preparation of the target material: according to the mass percentage of 39.83% ~ 49.13%, 50 ~ 60%, 0.17 ~ 0.87%, weigh SrO, (NH 4 ) 2 SO 4 and Sm 2 o 3 After the powder is ground and mixed evenly, it is sintered at 900-1300°C (preferably 1250°C), cooled naturally to obtain a target sample, and the target sample is cut into a target with a diameter of 50mm and a thickness of 2mm;
[0020] Step S2, put the target and substrate (such as glass) in step S1 into the vacuum chamber of the magnetron sputtering coating equipment, and use a mechanical pump and a molecular pump to pump the vacuum of the chamber to 1.0×10 -3 Pa~1.0×10 -5 Pa, preferably 5.0×10 -4 Pa;
[0021] Step S3, adjusting the magnetron sputtering coating process parameters as follows: the base-target distance is 45-95mm, preferably 60mm; the substrate temperature is 250°C-750°C, preferably 500°C; the gas flow rate of the argon working gas is 10-35sccm, preferably 25sccm; the working pressure of...
Embodiment 1
[0028] 1. According to the mass percentage, weigh the powder: (NH 4 ) 2 SO 4 56%, Sm 2 o 3 0.55% and SrO 43.45%; these powders were ground and mixed evenly, sintered at 1250°C, and cooled naturally to obtain target samples, which were cut into targets with a diameter of 50 mm and a thickness of 2 mm;
[0029] 2. Put the target into the vacuum chamber of the magnetron sputtering coating equipment;
[0030] 3. Clean the glass substrate ultrasonically with acetone, absolute ethanol and deionized water successively, and perform oxygen plasma treatment on it, and then put it into the vacuum chamber of the magnetron sputtering coating equipment; among them, the substrate of the target and the glass Target spacing is set to 60mm;
[0031] 4. Use a mechanical pump and a molecular pump to pump the vacuum of the vacuum chamber of the magnetron sputtering coating equipment to 5.0×10 -4 Pa;
[0032] 5. Adjust the process parameters of magnetron sputtering coating: the flow rate of ...
Embodiment 2
[0036] 1. According to the mass percentage, weigh the powder: (NH 4 ) 2 SO 4 50%, Sm 2 o 3 0.87% and 49.13% SrO; these powders were ground and mixed evenly, sintered at 900°C, and cooled naturally to obtain target samples, which were cut into targets with a diameter of 50mm and a thickness of 2mm;
[0037] 2. Put the target into the vacuum chamber of the magnetron sputtering coating equipment;
[0038] 3. Clean the glass ultrasonically with acetone, absolute ethanol and deionized water successively, and perform oxygen plasma treatment on it, and then put it into the vacuum chamber of the magnetron sputtering coating equipment; among them, the distance between the target and the glass Set to 45mm;
[0039] 4. Use a mechanical pump and a molecular pump to pump the vacuum of the vacuum chamber of the magnetron sputtering coating equipment to 1.0×10 -3 Pa;
[0040] 5. Adjust the process parameters of magnetron sputtering coating: the flow rate of argon working gas is 10sccm...
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