UV imposition method and device

A master and grid technology, applied in the field of UV imposition method and device of devices, can solve the problems of non-splicing, limited fidelity, low position accuracy, etc., achieve excellent filling ability, high positioning accuracy, and wide application range Effect

Active Publication Date: 2016-06-08
HUBEI XINGLONG PACKAGING MATERIAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the limitations of its principle and process, it has the following defects: (1) During the imposition process of the large-size hologram master, it is difficult to ensure the flatness and temperature uniformity of the imposition head, and only small-size holograms can be spliced. The unit size is mostly within the range of 10 cm X 10 cm, and large-sized unit holograms cannot be spliced; (2), mechanical imposition uses heat pressure to generate deformation for copying, but the information loss is large, and hot stamping (imposition) head The temperature is higher, and the action time is longer, a large amount of heat will be transferred to the imposition substrate, causing thermal deformation, resulting in low position accuracy, limited fidelity, and cannot splicing optical with deep groove structure. Devices, such as lenses and microprisms with a groove depth of more than 20 microns, the groove depth of the spliced ​​pattern can only be about 1 micron. Therefore, for large-sized unit holographic patterns, especially for optical devices with deep groove structures , there is no ideal imposition method and device

Method used

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Embodiment Construction

[0047] The present invention will be further described in detail below in conjunction with the drawings and specific embodiments.

[0048] Such as Picture 12 As shown, the UV imposition method of the present invention includes the following steps:

[0049] Step 1: Prepare a unit pattern master 1 for imposition. The size of the unit pattern master 1 is not limited. The unit pattern master 1 has the required splicing pattern 2, and the splicing pattern 2 is a hologram or has The optical structure of the deep groove is about 30-40 microns thick, and the alignment cross marks 4 are made at the four corners of the required splicing pattern 2. This mark line can be made by photolithography or drawn with fine needles. Cell graphics master 1 such as figure 1 As shown, the shape of the puzzled figure can be any shape such as square, rectangle, triangle, prism, trapezoid, hexagon, etc.; fix the unit pattern master 1 with thin tape 5 on the large glass plate 3, the glass plate 3 For a thic...

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Abstract

The invention discloses a UV makeup method of large-size unit holographic figures and of an optical structure part for ultrafine processing having a deep trough structure and a device. According to the method, a unit figure mother set is pasted on a glass plane, surface tension of one face of a PET film is increased, a photosensitive negative film is pasted on the other face of the PET film, the PET film is placed on an upper surface of the unit figure mother set, one end of the PET film is pasted on the glass plane, spliced long plaids of the photosensitive negative film are pasted with a mask plate for exposure, a light transmission area on the mask plate and the long plaid on the photosensitive negative film are aligned, the PET film is turned over to expose the unit figure mother set, one or more rows of UV glue are dropped on one end of the unit figure mother set, the UV glue is distributed on a surface of the glue solution, the UV glue in the light transmission area on the mask plate is solidified, a pattern on the unit figure mother set is transferred to the PET film and is attached to a surface of the PET film to accomplish splicing of the pattern. The UV makeup method can realize makeup with high fidelity.

Description

Technical field [0001] This patent relates to the technical field of ultra-fine processing and holography, and specifically relates to a UV imposition method and device for devices with large-size unit holographic patterns and ultra-fine processing optical structures with deep groove structures. Background technique [0002] UV is the abbreviation of ultraviolet light. The wavelength of ultraviolet light is 10-400nm, which has strong penetrating power and can penetrate most transparent glass and plastics. [0003] PET is the abbreviation of English Polyethyleneterephthalate, PET film is polyethylene terephthalate plastic film, mainly including polyethylene terephthalate PET and polybutylene terephthalate PBT. [0004] The main imposition technology at home and abroad is mechanical imposition technology. Other imposition technologies have relatively small adaptability and have certain limitations. At present, the mechanical imposition technology widely used at home and abroad uses th...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03H1/04
Inventor 吴婷婷汤炼
Owner HUBEI XINGLONG PACKAGING MATERIAL
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