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A method and apparatus for reducing debris using a metal droplet curtain

A metal liquid droplet and metal liquid technology, applied in X-ray tubes, discharge tubes, electrical components and other directions with huge currents, can solve the problem of low debris blocking efficiency

Active Publication Date: 2016-06-29
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method can effectively improve the light transmittance, but the debris blocking efficiency is low

Method used

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  • A method and apparatus for reducing debris using a metal droplet curtain
  • A method and apparatus for reducing debris using a metal droplet curtain
  • A method and apparatus for reducing debris using a metal droplet curtain

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Embodiment Construction

[0027] The present invention proposes a method and a corresponding device for reducing debris. In general, the method of the present invention employs a flow of molten metal placed in the propagation path of the debris to entrain the debris. For the EUV light source system, since the propagation path of debris and EUV light is the same, in order to ensure that the metal liquid will not block the propagation of EUV light, the present invention uses a metal drop curtain as the flowing metal liquid, thus EUV light can Spread through gaps between liquid metal curtains.

[0028] The device of the present invention accordingly adopts a device capable of generating flowing metal liquid as a debris collector, especially a debris collector formed by a curtain of metal liquid droplets, so as to effectively reduce the pollution of debris to components such as collecting mirrors.

[0029] The liquid metal of the present invention can be gallium, indium, tin, rubidium, potassium, sodium a...

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Abstract

The invention discloses a method and apparatus for reducing debris by using a metal liquid drop curtain. The metal liquid drop curtain includes a plurality of metal liquid drop strings that move from up to down; and each of the metal liquid drop strings is formed by metal liquid drops at a certain interval. The apparatus comprises a metal liquid drop generating device (10) and a metal liquid drop collecting device (11); the metal liquid drop generating device (10) that is arranged right above the metal liquid drop collecting device (11) includes a plurality of jet orifices, wherein openings of the jet orifices are arranged vertically and downwardly; and each of the jet orifices can eject the metal liquid drop string formed by the metal liquid drops at the certain interval. And the metal liquid drop collecting device (11) has a liquid drop inlet right opposite to a metal liquid drop curtain (12), so that the metal liquid drop curtain (12) can flow through the liquid drop inlet and then be collected. According to the invention, the debris content can be effectively reduced; and the apparatus and the method can be applied to an EUV light source system, thereby effectively reducing the debris pollution and element damages.

Description

technical field [0001] The present invention relates to a method and device for reducing debris, in particular to a method and device for reducing light source debris in an EUV light source system. Background technique [0002] Charged particles, electrically neutral particles, residual gases and other debris can cause serious pollution and harm to vacuum chambers and components. Taking the EUV light source system as an example, while the EUV radiation source radiates extreme ultraviolet light, it also produces charged particles, electrically neutral particles, residual gases and other debris. These waste substances (especially the charged particles and electrically neutral particles) have high output energy, and propagate along the optical path to the subsequent optical system, which will cause serious pollution and damage to the surface of the optical instrument. Therefore, it is necessary to remove the debris in time before it spreads to the optical system, so as to redu...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H05G2/00
Inventor 王宇谢婉露吴晓斌张罗莎陈进新王魁波罗艳
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI