Transfer device and transfer method
A transfer material and relative position technology, applied in transfer printing, measuring device, rotary printing machine, etc., can solve the difficult handling of positioning marks, the alignment obstacle of substrate and carrier, difficult light quantity and contrast shooting positioning marks, etc. question
Active Publication Date: 2013-10-23
DAINIPPON SCREEN MTG CO LTD
View PDF7 Cites 1 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
[0005] In these cases, it is difficult to photograph the registration marks with sufficient light and contrast
In particular, in the state where the focus has not been completed, it is difficult to recognize the positioning mark from the image obtained by shooting. Therefore, there may be problems with the alignment of the substrate and the carrier due to improper focus of the shooting unit. obstacle situation
In the conventional technology including the technology described in the above-mentioned Patent Document 1, there is no response to such a problem.
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0045] figure 1 It is a schematic perspective view showing a printing device equipped with the transfer device of the present invention, and shows a state where the device casing is removed in order to clearly show the internal structure of the device. in addition, figure 2 is schematically shown figure 1 A cross-sectional view of the printing apparatus is shown. and, image 3 is shown figure 1 A block diagram of the electrical structure of the device. In this printing apparatus 100, the upper surface of the blanket carried into the apparatus from the front side of the apparatus is brought into close contact with the lower surface of the plate PP carried into the apparatus from the left side of the apparatus, and then peeled off. This uses the pattern formed on the lower surface of the plate PP to write a pattern on the coating layer of the blanket to form a pattern layer (pattern writing process). In addition, in the printing apparatus 100, the upper surface of the bla...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
Login to View More Abstract
The present invention aims at providing a technology capable of performing alignment with high precision to a substrate and a carrying body even in the case of no good shot environment in the technique for transferring a transferred object carried on the carrying body onto the substrate. For image data (A) obtained by shooting a positioning pattern (AP2), filtering processing for removing frequency component higher than spatial frequency corresponding to line width of the pattern is performed, so as to obtain data (B) in which the influence of random noise is removed. Further, data (C) in which only the component (mainly dark spot component) lower than the spatial frequency corresponding to line width of the pattern is extracted is obtained. The dark spot component is removed by obtaining the ratio between the data (B) and the data (C), then an enhancement factor greater than 1 is multiplied, so as to obtain data (D) with an enhanced edge portion of the positioning pattern (AP2).
Description
technical field [0001] The present invention relates to a transfer device and a transfer method for transferring a pattern or a thin film carried on the surface of a carrier onto a substrate. In particular, it relates to a technique for aligning a substrate and a carrier based on imaging results of alignment marks placed on a carrier. Background technique [0002] As a technique for forming a pattern or a thin film on the surface of a substrate, for example, there is a technique of temporarily supporting a pattern or a thin film as an object to be transferred on the surface of a flat support (such as a glass plate), and by making the support A technique in which the carrier adheres closely to the surface of the substrate to transfer the material to be transferred onto the surface of the substrate. In such a transfer technique, in order to properly transfer an object to be transferred to a predetermined position on the surface of the substrate, positioning processing for ali...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More Patent Type & Authority Applications(China)
IPC IPC(8): B41F16/00B41F33/00B41M5/382
CPCB41F16/0093B41J3/46G01B11/00
Inventor 谷口和隆川越理史
Owner DAINIPPON SCREEN MTG CO LTD