Device with manganese oxide film adjustable and controllable in magnetic domain wall and magnetic domain wall adjusting and controlling method
A technology of manganese oxide and magnetic domain wall, which is applied in the field of devices with adjustable manganese oxide thin film and magnetic domain wall regulation, which can solve the problems of large power loss, large power consumption, and a large amount of waste heat.
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Embodiment 1
[0034] Using pulsed laser deposition technique, optically polished LaAlO 3Epitaxially grown La on (001) single crystal substrate 0.67 Sr 0.33 MnO 3 film. During the preparation process, the substrate temperature was 780° C., the oxygen pressure was 50 Pa, the laser energy was 170 mJ, the frequency was 3 Hz, and the distance between the substrate and the target was 4.1 cm. The coating time is 15 minutes. After the preparation, the film was annealed in situ at 700 °C, and the oxygen pressure during annealing was 4×10 4 Pa, the annealing time is 10 minutes, and then the temperature is naturally lowered. Income La 0.67 Sr 0.33 MnO 3 The thickness is about 100nm. Label this sample LSMO / LAO. The LSMO / LAO sample is taken out and placed on a metal conductive base (such as a copper base), and the sample is in close contact with the conductive base to form a manganese oxide core unit with adjustable magnetic domain walls.
[0035] in the la 0.67 Sr 0.33 MnO 3 Randomly sele...
Embodiment 2
[0043] Adopt the same method in embodiment 1 to prepare La (1-x) Ba x MnO 3 (x=0.2, 0.3), and using the same method to control the magnetic domain, a magnetic domain structure similar to that of Example 1 was obtained.
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