Integrated type both-way ultra-low capacitance TVS device and manufacturing method thereof
A manufacturing method and integrated technology, applied in semiconductor/solid-state device manufacturing, electrical solid-state devices, electrical components, etc., to improve device quality and avoid defects
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[0074] The integrated bidirectional ultra-low capacitance TVS device and its manufacturing method proposed by the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments. Advantages and features of the present invention will be apparent from the following description and claims. It should be noted that all the drawings are in a very simplified form and use imprecise scales, and are only used to facilitate and clearly assist the purpose of illustrating the embodiments of the present invention.
[0075] This embodiment provides a method for manufacturing an integrated bidirectional ultra-low capacitance TVS device, including:
[0076] S10: providing a first conductivity type substrate;
[0077] S11: forming a first conductivity type epitaxial layer on the first conductivity type substrate;
[0078] S12: forming a second conductivity type buried layer in the first conductivity type epitaxial layer;
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Abstract
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