Method for determining base sequence of polynucleotide and device for determining base sequence of polynucleotide

A base sequence and polynucleotide technology, applied in the field of determining the base sequence of polynucleotides and devices for determining the base sequence of polynucleotides, can solve problems such as system instability and limited pore size selection

Active Publication Date: 2018-12-28
OSAKA UNIV
View PDF8 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this technology has many problems such as (1) limited choice of aperture, (2) system instability, etc., and has not been put into practical use.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for determining base sequence of polynucleotide and device for determining base sequence of polynucleotide
  • Method for determining base sequence of polynucleotide and device for determining base sequence of polynucleotide
  • Method for determining base sequence of polynucleotide and device for determining base sequence of polynucleotide

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0265]

[0266] Formed using nanofabrication mechanically controlled junction breaking (MCBJ) figure 1 The electrode pair shown (cf. Tsutsui, M., Shoji, K., Taniguchi, M. Kawai, T., Formation and self-breaking mechanism of stableatom-sized junctions. Nano Lett. 8, 345-349 (2007)). Hereinafter, a method for producing the electrode pair will be briefly described.

[0267] Using an electron beam lithography apparatus (manufactured by JEOL Ltd., catalog number: JSM6500F), standard electron beam lithography and lift-off techniques were performed on polyimide (manufactured by Industrial Summit Technology, catalog number: Pyre-Ml) package. Nanoscale gold joints are patterned on a covered flexible metal substrate (phosphor bronze substrate).

[0268] Next, the polyimide located below the joint was removed by etching by a reactive ion etching method using a reactive ion etching apparatus (manufactured by Sumko Corporation, catalog number: 10NR). Then, the substrate was bent to fabr...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

For multiple pulses of tunneling current generated when a polynucleotide passes between a pair of electrodes, the maximum current value and pulse duration are measured for each pulse, and the base sequence of the polynucleotide is determined based on the maximum current value and pulse duration .

Description

technical field [0001] The present invention relates to a method for determining the base sequence of a polynucleotide and an apparatus for determining the base sequence of a polynucleotide. More specifically, the present invention relates to a method of determining the base sequence of a polynucleotide based on a tunneling current generated when the polynucleotide passes between a pair of electrodes and an apparatus for carrying out the method. Background technique [0002] The technique of analyzing the base sequence of polynucleotides is not limited to the field of academic research, but is also applied to fields such as medical treatment, drug development, and criminal investigation, and interest in the development of this technique is increasing. [0003] Existing sequencers for polynucleotides (specifically, DNA) are based on light measurement technology that recognizes fluorescent labels, and cannot directly recognize the nucleotides themselves that form the polynucle...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): G01N27/00C12N15/00G16B30/00
CPCG01N33/48721C12Q1/6869G16B30/00C12Q2563/116C12Q2565/607C12Q2565/601
Inventor 川合知二大城敬人松原一喜古桥匡幸筒井真楠谷口正辉
Owner OSAKA UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products