Dual-power adaptive control technology applied to polycrystalline silicon ingot casting
An adaptive control and polysilicon technology, which is applied in the growth of polycrystalline materials, crystal growth, single crystal growth, etc., can solve the problems of inaccurate temperature control, decline in ingot quality, waste of energy distribution, etc., and achieve the improvement of photoelectric conversion efficiency , Reduce power consumption and reduce energy loss
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Embodiment 1
[0022] Polysilicon ingot production is carried out according to the following process:
[0023] (1) Loading and vacuuming: put 650kg of polysilicon material with a purity of 5N into the quartz crucible in the ingot furnace, and then vacuumize to 0.6Pa.
[0024] (2) Melting and heat preservation: Argon gas is introduced as a protective gas to keep the pressure in the furnace at 40kPa. In power mode, the power distribution P1:P2=1:1 through the adaptive system makes the temperature in the quartz crucible reach within 4 hours. The melting temperature of the polysilicon material, and then adopt the temperature control mode, distribute the power P1:P2=1:1.5 through the adaptive system, and keep it in the range of 1550-1565°C for 11 hours until the silicon material is completely melted.
[0025] (3) Crystal growth: after the heat preservation is over, the adaptive system distributes the power P1:P2=1:1, the temperature drops from 1550~1565°C to 1430°C for 0.5h to start crystal growt...
Embodiment 2
[0031] Polysilicon ingot production is carried out according to the following process:
[0032] (1) Loading and vacuuming: Put 650kg of polysilicon material with a purity of 6N into the quartz crucible in the ingot furnace, and then vacuumize to 1.0Pa.
[0033] (2) Melting and heat preservation: Argon gas is introduced as a protective gas to keep the pressure in the furnace at 60kPa. In the power mode, the power distribution P1:P2=1:1 through the adaptive system makes the temperature in the quartz crucible reach within 6 hours. The melting temperature of the polysilicon material, and then adopt the temperature control mode, distribute the power P1:P2=1:2.5 through the adaptive system, and keep it in the range of 1550-1565°C for 14h until the silicon material is completely melted.
[0034] (3) Crystal growth: After the heat preservation is over, the adaptive system distributes power P1:P2=1:1.75, and the temperature drops from 1550~1565°C to 1440°C for 1 hour to start crystal g...
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