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Czochralski single crystal furnace magnetic field device and crystal pulling method using the magnetic field device

A single crystal furnace and single crystal pulling technology, which is applied to the magnetic field device of Czochralski single crystal furnace and the field of crystal pulling, can solve the problem that the heat convection of the melt cannot be completely suppressed, and achieve stable growth, reduce energy consumption and cost. low effect

Active Publication Date: 2016-04-27
YINCHUAN LONGI SILICON MATERIALS
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Problems solved by technology

[0004] The object of the present invention is to provide a Czochralski single crystal furnace magnetic field device and a crystal pulling method using the Czochralski single crystal furnace magnetic field device to solve the problem that the heat convection of the melt cannot be completely suppressed in the existing Czochralski single crystal process problems to improve single crystal quality

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  • Czochralski single crystal furnace magnetic field device and crystal pulling method using the magnetic field device
  • Czochralski single crystal furnace magnetic field device and crystal pulling method using the magnetic field device

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Embodiment Construction

[0012] The Czochralski single crystal furnace magnetic field device and the crystal pulling method using the Czochralski single crystal furnace magnetic field device of the present invention will be described in detail below with reference to the drawings and embodiments.

[0013] refer to figure 1 , the present invention provides a Czochralski single crystal furnace magnetic field device 10 for applying a magnetic field during the Czochralski single crystal process. In the Czochralski single crystal furnace 100 , a crucible 102 and a heater (not shown in the figure) are arranged inside the furnace tube 101 , the crucible 102 contains a melt 103 , and the heater is used to heat the melt 103 . During the Czochralski single crystal process, the seed crystal 104 rotates and rises, successively goes through the stages of seeding, shoulder setting, shoulder turning, equal diameter and finishing, and gradually lengthens and thickens to obtain a single crystal product.

[0014] The ...

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Abstract

The invention discloses a Czochralski crystal growing furnace magnetic field device for applying a magnetic field for a melt in a crucible. The Czochralski crystal growing furnace magnetic field device comprises a first coil and a second coil which are vertically arranged around the crucible, wherein the first coil and the second coil are coaxial with the crucible. A magnetic field formed by the first coil and the second coil is provided with a sunken interface. The magnetic field strength of a region above the interface is zero. The interface is provided with a first side edge and a second side edge which are opposite. The first side edge and the second side edge both extend towards the direction far away from the crucible along an extension line of the side wall of the crucible. The Czochralski crystal growing furnace magnetic field device disclosed by the invention is low in cost, capable of generating a changed magnetic field and particularly a special-shaped magnetic field with high strength inside the melt and zero strength above the interface, capable of effectively inhibiting the heat convection of the melt and beneficial to the stable growth of a single crystal and the acquisition of a high-quality single crystal. The invention also provides a method for pulling a crystal by using the Czochralski crystal growing furnace magnetic field device.

Description

technical field [0001] The invention belongs to the technical field of single crystal manufacturing, relates to a magnetic field device for a Czochralski single crystal furnace, and also relates to a crystal pulling method using the magnetic field device for a Czochralski single crystal furnace. Background technique [0002] With the continuous development of the world economy, the demand for high-efficiency energy in modernization is increasing. Photovoltaic power generation, as one of the main energy sources for green energy and sustainable development of human beings, has been increasingly valued and developed vigorously by countries all over the world. As one of the basic materials for photovoltaic power generation, monocrystalline silicon wafers have a wide market demand. A common silicon single crystal growth method is the Czochralski method, that is, in a single crystal furnace, the seed crystal is immersed in a melt contained in a quartz crucible to pull the seed cr...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C30B30/04C30B15/00
Inventor 李定武周锐李侨邓浩马自成
Owner YINCHUAN LONGI SILICON MATERIALS
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