Double-end applying method of asymmetric high-voltage MOS devices
A technology of MOS devices and application methods, which is applied in the direction of electrical components, pulse technology, electronic switches, etc., can solve problems such as high process requirements, slow development of analog switches, and inability to complete the design of high-voltage analog switches, so as to save costs and process selection flexible effects
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[0018] In order to make the object, technical solution and advantages of the present invention clearer, the double-terminal application method of the asymmetric high-voltage MOS device according to the present invention will be further described in detail by taking the use of a high-voltage NMOS transistor as an example. The illustrative embodiments and descriptions of the present invention are presented herein for purposes of illustration and description, not limitation of the present invention.
[0019] Table 1 shows the withstand voltage parameters of high-voltage devices provided by a certain process. It can be seen from Table 1 that for NMOS, PMOS and DMOS, the source-drain withstand voltage (VDS) and the drain-substrate withstand voltage (VDB) can reach very high, but the source-substrate withstand voltage (VSB ) are restricted.
[0020] Table 1
[0021]
[0022] In general, asymmetric high-voltage MOS devices have a relatively high source-drain withstand voltage (V...
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